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Inventor

Viacheslav Medvedev

Inventor
Moscow, RU

Overview

3→
Patents
2015–2016
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H05GX-ray technique33%
G02BOptical elements, systems or apparatus11%
G21KHandling of particles or ionising radiation not otherwise provided for11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
9,411,238'Source-collector device, lithographic apparatus, and device manufacturing method'20169,366,967'Radiation source'20169,007,565'Spectral purity filter'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2016Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2015–2016Patents assigned to KRIVTSUN VLADIMIR MIHAILOVITCH (2)· patent assignee history
2015–2016Patents assigned to MEDVEDEV VIACHESLAV (2)· patent assignee history
2015–2016Patents assigned to YAKUNIN ANDREI MIKHAILOVICH (2)· patent assignee history
2015–2016Based in Moscow, RU· patent location history
2016Patents assigned to IVANOV VLADIMIR VITALEVICH (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32015–2016
KRIVTSUN VLADIMIR MIHAILOVITCH22015–2016
MEDVEDEV VIACHESLAVself22015–2016
YAKUNIN ANDREI MIKHAILOVICH22015–2016
IVANOV VLADIMIR VITALEVICH12016
Locations
LocationPatentsSpan
Moscow, RU32015–2016