Inventor
Takayuki Haraguchi
Inventor
Kanagawa, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
H04NPictorial communication, e.g. television16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C11DDetergent compositions11%
H01LSemiconductor devices8%
C23FNon-mechanical removal of metallic material from surface5%
G08BSignalling systems, e.g. personal calling systems5%
B08BCleaning in general3%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
PatentTitleYear
10,597,609Cleaning liquid, anticorrosion agent, and method for manufacturing the same202010,597,616Cleaning liquid and method for manufacturing the same20209,609,266'Image recording apparatus and image recording method for rapid mirroring restoration'20179,602,711'Wearable camera system and recording control method'20179,436,094'Stripping solution for photolithography and pattern formation method'20169,250,534'Nonaqueous cleaning liquid and method for etching processing of silicon substrate'20168,942,435'Pre-record data storage device and pre-record data storage method'20158,908,042'Monitoring camera system, video recording apparatus and video recording method'20148,802,610'Cleaning liquid and anticorrosive agent comprising a mercapto compound and solvent'20148,623,236'Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film'20148,400,508'Monitoring system'20138,355,061'Image record apparatus and image record method for calculating and setting a pre-record volume'20138,354,215'Method for stripping photoresist'20137,442,675'Cleaning composition and method of cleaning semiconductor substrate'20087,129,020'Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern'20066,399,275'Negative-working photolithographic patterning material and method for the preparation of ion-implanted and metal-plated substrates by using the same'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2020Patents assigned to TOKYO OHKA KOGYO CO LTD (10)· patent assignee history
2002–2014Based in Kanagawa, JP· patent location history
2013–2015Patents assigned to HARAGUCHI TAKAYUKI (6)· patent assignee history
2013–2015Patents assigned to SUGIMOTO KENICHIRO (4)· patent assignee history
2013–2014Patents assigned to PANASONIC CORP (3)· patent assignee history
2013Based in Tokyo, JP· patent location history
2014–2017Based in Fukuoka, JP· patent location history
2014–2016Based in Kawasaki, JP· patent location history
2015–2017Patents assigned to PANASONIC IP MAN CO LTD (3)· patent assignee history
2020Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 10 | 2002–2020 |
| HARAGUCHI TAKAYUKIself | 6 | 2013–2015 |
| SUGIMOTO KENICHIRO | 4 | 2013–2015 |
| PANASONIC CORP | 3 | 2013–2014 |
| PANASONIC IP MAN CO LTD | 3 | 2015–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 6 | 2002–2014 |
| Fukuoka, JP | 4 | 2014–2017 |
| Kawasaki, JP | 3 | 2014–2016 |
| Hsinchu, TW | 2 | 2020 |
| Tokyo, JP | 1 | 2013 |