Inventor
JUNYI NAN
Inventor
CN
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B23Kprimary
B23KSoldering or unsoldering25%
G02BOptical elements, systems or apparatus25%
B01LChemical or physical laboratory apparatus for general use8%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems8%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light8%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
G03HHolographic processes or apparatus8%
PatentTitleYear
12,202,073Method for manufacturing large-area volume grating via plasma grating direct writing202511,964,340Device for fabricating quartz microfluidic chip by femtosecond pulse cluster202411,899,229Method and apparatus for preparing femtosecond optical filament interference direct writing volume grating/chirped volume grating202411,370,657Method and apparatus for manufacturing microfluidic chip with femtosecond plasma grating2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to CHONGQING INSTITUTE OF EAST CHINA NORMAL UNIV (4)· patent assignee history
2022–2025Patents assigned to ROI OPTOELECTRONICS TECH CO LTD (4)· patent assignee history
2022–2025Patents assigned to UNIV EAST CHINA NORMAL (4)· patent assignee history
2022–2025Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHONGQING INSTITUTE OF EAST CHINA NORMAL UNIV | 4 | 2022–2025 |
| ROI OPTOELECTRONICS TECH CO LTD | 4 | 2022–2025 |
| UNIV EAST CHINA NORMAL | 4 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| CN | 4 | 2022–2025 |