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Inventor

Marcus Adrianus Van De Kerkhof

Inventor
Helmond, NL

Overview

72→
Patents
2003–2020
Patent span
Physics
Primary field (CPC G)

Patents· 72 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
G02BOptical elements, systems or apparatus7%
Y10TTechnical subjects covered by former us classification3%
H01LSemiconductor devices2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
B21BRolling of metal1%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form1%
PatentTitleYear
10,732,511Projection system and mirror and radiation source for a lithographic apparatus202010,732,498Patterning device202010,678,139Lithographic apparatus and device manufacturing method202010,514,618Lithographic apparatus and device manufacturing method201910,466,585Pellicle and pellicle assembly201910,401,723Patterning device201910,216,093Projection system and minor and radiation source for a lithographic apparatus201910,180,629Lithographic apparatus and device manufacturing method201910,088,755Lithographic apparatus and device manufacturing method201810,025,204Lithographic apparatus and device manufacturing method20189,798,250'Lithographic apparatus for measuring overlay error and a device manufacturing method'20179,746,785'Sub-wavelength segmentation in measurement targets on substrates'20179,715,179'Lithographic apparatus and device manufacturing method'20179,658,541'Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate'20179,594,310'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method'20179,594,311'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method'20179,568,841'Lithographic apparatus and device manufacturing method'20179,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,529,278'Inspection apparatus to detect a target located within a pattern for lithography'20169,494,872'Inspection method for lithography'20169,482,967'Lithographic apparatus, control system and device manufacturing method'20169,436,099'Lithographic focus and dose measurement using a 2-D target'20169,316,919'Lithographic apparatus and device manufacturing method'20169,280,065'Inspection apparatus to detect a target located within a pattern for lithography'20169,255,892'Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus'20169,229,338'Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus'20169,217,916'Lithographic apparatus and device manufacturing method'20159,201,310'Method of measuring overlay error and a device manufacturing method'20159,182,678'Lithographic apparatus and device manufacturing method'20159,170,498'Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor'20159,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'20158,988,658'Inspection apparatus to detect a target located within a pattern for lithography'20158,988,653'Lithographic apparatus, distortion determining method, and patterning device'20158,982,347'Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus'20158,982,329'Method and apparatus for measuring line end shortening, substrate and patterning device'20158,947,637'Lithographic apparatus and device manufacturing method'20158,947,632'Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate'20158,896,817'Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method'20148,891,061'Lithographic focus and dose measurement using a 2-D target'20148,860,928'Lithographic apparatus, computer program product and device manufacturing method'20148,848,195'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate'20148,830,472'Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus'20148,823,919'Lithographic apparatus, removable member and device manufacturing method'20148,786,825'Apparatus and method of measuring a property of a substrate'20148,773,637'Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark'20148,724,087'Inspection apparatus for lithography'20148,659,741'Lithographic apparatus, removable member and device manufacturing method'20148,629,418'Lithographic apparatus and sensor therefor'20148,547,522'Dedicated metrology stage for lithography applications'20138,482,718'Lithographic apparatus and device manufacturing method'20138,482,845'Lithographic apparatus and device manufacturing method'20138,462,314'Lithographic apparatus and device manufacturing method'20138,436,984'Lithographic apparatus and method of irradiating at least two target portions'20138,263,296'Lithographic apparatus and device manufacturing method'20128,233,134'Lithographic apparatus and device manufacturing method'20128,068,212'Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements'20118,049,864'Device manufacturing method and lithographic apparatus'20118,045,134'Lithographic apparatus, control system and device manufacturing method'20118,035,798'Lithographic apparatus and device manufacturing method'20117,907,255'Lithographic apparatus and device manufacturing method'20117,889,315'Lithographic apparatus, lens interferometer and device manufacturing method'20117,829,249'Device manufacturing method, computer program and lithographic apparatus'20107,619,747'Lithographic apparatus, analyzer plate, subassembly, method of measuring a parameter of a projection system and patterning device'20097,518,703'Lithographic apparatus and method'20097,459,669'Sensor and lithographic apparatus'20087,443,485'Apodization measurement for lithographic apparatus'20087,375,799'Lithographic apparatus'20087,315,353'Apodization measurement for lithographic apparatus'20087,213,963'Lithographic apparatus and device manufacturing method'20077,145,630'Lithographic apparatus and device manufacturing method'20066,650,399'Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2020Patents assigned to ASML NETHERLANDS BV (72)· patent assignee history
2003–2020Based in Helmond, NL· patent location history
2011–2017Patents assigned to VAN DE KERKHOF MARCUS ADRIANUS (34)· patent assignee history
2013–2017Patents assigned to SENGERS TIMOTHEUS FRANCISCUS (6)· patent assignee history
2013–2017Patents assigned to KROON MARK (5)· patent assignee history
2014–2017Patents assigned to VAN DER SCHAAR MAURITS (6)· patent assignee history
2019–2020Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV722003–2020
VAN DE KERKHOF MARCUS ADRIANUSself342011–2017
SENGERS TIMOTHEUS FRANCISCUS62013–2017
VAN DER SCHAAR MAURITS62014–2017
KROON MARK52013–2017
Locations
LocationPatentsSpan
Helmond, NL702003–2020
Veldhoven, NL22019–2020