Inventor
SATORU KAWAKAMI
Inventor
JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H05HPlasma technique16%
C23CCoating metallic material13%
H01LSemiconductor devices10%
B60WConjoint control of vehicle sub-units of different type or different function4%
Y02PClimate change mitigation technologies in the production or processing of goods3%
B08BCleaning in general1%
B60QArrangement of signalling or lighting devices, the mounting or supporting thereof or circuits therefor, for vehicles in general1%
G06FElectric digital data processing1%
PatentTitleYear
12,534,088Distraction judgment device, distraction judgment method, and nontransitory computer storage medium202612,482,637Plasma source and plasma processing apparatus202512,482,635Plasma processing device, and plasma processing method202512,466,316Notification control device and notification control method202512,456,609Plasma processing apparatus202512,451,326Plasma processing apparatus and plasma processing method202512,412,732Plasma processing apparatus202512,362,143Plasma processing apparatus and plasma processing method202512,362,151Plasma processing apparatus and plasma processing method202512,351,204Monitoring system, storage medium storing computer program for monitoring and method for monitoring202512,283,465Plasma processing apparatus and plasma processing method202512,261,025Plasma processing apparatus202512,217,941Plasma processing apparatus, and plasma processing method202512,183,929Energy storage device and method for manufacturing the same202412,148,637Substrate processing apparatus202412,051,564Shower plate, plasma processing apparatus and plasma processing method202412,046,455Shower plate, lower dielectric member and plasma processing apparatus202412,020,900Plasma processing device, and plasma processing method202411,929,234Plasma processing apparatus and lower stage202411,923,170Plasma processing apparatus and plasma processing method202411,538,667Stage, plasma processing apparatus, and plasma processing method2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history
2022–2026Based in JP· patent location history
2024–2025Patents assigned to UNIV TOHOKU (4)· patent assignee history
2024Patents assigned to GS YUASA INT LTD (1)· patent assignee history
2025–2026Patents assigned to TOYOTA MOTOR CO LTD (3)· patent assignee history
2025–2026Patents assigned to DENSO CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 17 | 2022–2025 |
| UNIV TOHOKU | 4 | 2024–2025 |
| TOYOTA MOTOR CO LTD | 3 | 2025–2026 |
| DENSO CORP | 2 | 2025–2026 |
| GS YUASA INT LTD | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 21 | 2022–2026 |