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Inventor

Yasuyuki Ido

Inventor
Yamanashi, JP

Overview

1→
Patents
2018
Patent span
Performing operations
Primary field (CPC B)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Bprimary
B05BSpraying apparatus25%
B05CApparatus for applying fluent materials to surfaces, in general25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,922,849'Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2018Based in Yamanashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD12018
Locations
LocationPatentsSpan
Yamanashi, JP12018