Inventor
Wan-Chun Pan
Inventor
Hsinchu, TW
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices30%
H01LSemiconductor devices26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
B08BCleaning in general4%
B24BMachines, devices, or processes for grinding or polishing4%
B82YSpecific uses or applications of nanostructures4%
PatentTitleYear
10,522,365Methods for reducing scratch defects in chemical mechanical planarization20199,592,585'System and method for CMP station cleanliness'20179,508,716'Methods of manufacturing a semiconductor device'20169,153,657'Semiconductor devices comprising a fin'20159,064,959'Method and apparatus for forming a CMOS device'20159,048,087'Methods for wet clean of oxide layers over epitaxial layers'20158,889,497'Semiconductor devices and methods of manufacture thereof'20148,853,083'Chemical mechanical polish in the growth of semiconductor regions'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2015Patents assigned to TAIWAN SEMICONDUCTOR MFG (5)· patent assignee history
2014–2019Based in Hsinchu, TW· patent location history
2016–2019Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 5 | 2014–2015 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 3 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 8 | 2014–2019 |