LexDanaLexDanabeta
Inventor

Paulus Albertus Maria Gasseling

Inventor
Steensel, NL

Overview

2→
Patents
2015–2017
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G21KHandling of particles or ionising radiation not otherwise provided for33%
PatentTitleYear
9,606,445'Lithographic apparatus and method of manufacturing a device'20178,970,818'Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2017Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2015Patents assigned to GASSELING PAULUS ALBERTUS MARIA (1)· patent assignee history
2015Patents assigned to HUIJBERTS ALEXANDER MARINUS ARNOLDUS (1)· patent assignee history
2015Patents assigned to JANSSEN FRANCISCUS JOHANNES JOSEPH (1)· patent assignee history
2015Patents assigned to NIENHUYS HAN-KWANG (1)· patent assignee history
2015–2017Based in Steensel, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22015–2017
GASSELING PAULUS ALBERTUS MARIAself12015
HUIJBERTS ALEXANDER MARINUS ARNOLDUS12015
JANSSEN FRANCISCUS JOHANNES JOSEPH12015
NIENHUYS HAN-KWANG12015
Locations
LocationPatentsSpan
Steensel, NL22015–2017