Inventor

Wolfgang Keller

Inventor

Munich, DE

Overview

1976–2019

Patent span

Chemistry

Primary field (CPC C)

Patents· 54 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C30Bprimary

C30BSingle-crystal growth24%

Y10TTechnical subjects covered by former us classification17%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%

H05BElectric heating4%

B01FMixing, e.g. dissolving, emulsifying or dispersing3%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%

B05BSpraying apparatus2%

C23CCoating metallic material2%

G02BOptical elements, systems or apparatus2%

PatentTitleYear

10,493,411Stirring device2019 10,252,227System and method for starting up stirring machines in a sediment2019 10,022,683Stirring device2018 9,033,572'Agitator for abrasive media'2015 8,696,861'Grindable silicone elastomer composition and the use thereof'2014 8,181,368'Steam iron with tank including overpressure safety device'2012 7,760,327'Reflecting optical element with eccentric optical passageway'2010 7,448,763'Optical subassembly and projection objective in semiconductor lithography'2008 7,382,220'Ignition coil for an internal combustion engine'2008 6,998,437'Preparation of polydiorganosiloxanes'2006 6,972,053'Installation for coating a workpiece with powder'2005 6,824,881'Thermoplastic silicone block copolymers, the production thereof and the use of the same'2004 6,783,053'Clamping mechanism for clamping sheet metal workpieces'2004 6,339,249'Semiconductor diode'2002 6,324,259'Scattered-ray grid, particularly for a medical X-ray device, and a method of determining the position of the absorption elements of a scattered-ray grid'2001 6,063,195'Powder coating system and method'2000 5,725,363'Micromembrane pump'1998 4,900,887'Floating zone drawing circuitry for semiconductor rods'1990 4,797,525'Induction heater for floating zone melting'1989 4,696,716'Apparatus for doping semiconductor rods with solid dopants'1987 4,579,719'Apparatus for crucible-free floating-zone melting a semiconductor rod, particularly of silicon'1986 4,538,279'Induction coil in the form of a pancake coil for crucible-free zone melting'1985 4,506,132'Induction coil in the form of a flat coil for crucible-free floating zone melting'1985 4,436,578'Method of setting a stable melting zone in a semiconductor crystalline rod during crucible-free zone melting thereof'1984 4,429,443'Machine tool'1984 4,392,230'Method and apparatus for the manufacture of silicon by crucible-free zone melting'1983 4,361,716'Current lead-in of the coaxial type for sealing to a container wall'1982 4,353,874'Rotary tube reactor for the thermal treatment of material'1982 4,331,827'Method of producing current lead-ins having coaxial construction'1982 RE030863'Method for crucible-free zone meeting of semiconductor crystal rods'1982 4,260,372'Rotary tube'1981 4,126,509'Process for producing phosophorous-doped silicon monocrystals having a select peripheral dopant concentration along a radial cross-section of such monocrystal'1978 RE029825'Apparatus for crucible-free zone melting of semiconductor crystal rods'1978 RE029824'Apparatus for crucible-free zone melting of semiconductor crystal rods'1978 4,108,714'Process for producing plate-shaped silicon bodies for solar cells'1978 4,045,278'Method and apparatus for floating melt zone of semiconductor crystal rods'1977 4,045,183'Support device for use in a crucible-free floating zone melting apparatus'1977 4,039,283'Apparatus for producing a controlled radial path of resistance in a semiconductor monocrystalline rod'1977 4,035,600'Apparatus for crucible-free zone processing of a semiconductor rod'1977 4,027,051'Method of producing homogeneously doped n-type Si monocrystals and adjusting dopant concentration therein by thermal neutron radiation'1977 4,020,791'Apparatus for indiffusing dopants into semiconductor material'1977 3,996,011'Apparatus for crucible-free zone melting of semiconductor crystal rods'1976 3,996,096'Method for crucible-free zone melting of semiconductor crystal rods'1976 3,994,776'Nuclear reactor installation'1976 3,989,468'Apparatus for crucible-free zone melting of semiconductor crystal rods'1976 3,988,197'Crucible-free zone melting of semiconductor crystal rods including oscillation dampening'1976 3,985,947'Device and method for crucible-free zone melting of crystallizable rods in particular semiconductor rods'1976 3,976,536'Method for producing a controlled radial path of resistance in a semiconductor monocrystalline rod'1976 3,961,906'Apparatus for crucible-free zone melting of semiconductor crystal rods including oscillation dampening material'1976 3,954,416'Apparatus for positively doping semiconductor crystals during zone melting'1976 3,953,796'Method and apparatus for measuring electrical conductivity'1976 3,950,479'Method of producing hollow semiconductor bodies'1976 3,939,035'Method of producing monocrystalline semiconductor material, particularly silicon, with adjustable dislocation density'1976 3,935,062'Nuclear power plant with a safety enclosure'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–2001Patents assigned to SIEMENS AG (32)· patent assignee history

1976–2001Based in Munich, DE· patent location history

1981–1982Patents assigned to BAYER AG (2)· patent assignee history

1984–2015Patents assigned to KELLER WOLFGANG (4)· patent assignee history

2000–2005Based in Wald/Ruhestetten, DE· patent location history

2004–2006Patents assigned to WACKER CHEMIE GMBH (2)· patent assignee history

2004–2006Based in Mehring, DE· patent location history

2008–2010Based in Erbach, DE· patent location history

2018–2019Patents assigned to EKATO RUEHR UND MISCHTECHNIK GMBH (3)· patent assignee history

2018–2019Based in Sierentz, FR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SIEMENS AG	32	1976–2001
KELLER WOLFGANGself	4	1984–2015
EKATO RUEHR UND MISCHTECHNIK GMBH	3	2018–2019
BAYER AG	2	1981–1982
WACKER CHEMIE GMBH	2	2004–2006

Locations

Location	Patents	Span
Munich, DE	31	1976–2001
Sierentz, FR	3	2018–2019
Erbach, DE	2	2008–2010
Mehring, DE	2	2004–2006
Wald/Ruhestetten, DE	2	2000–2005