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Inventor

Michiya Odawara

Inventor
Chichibu, JP

Overview

5→
Patents
2009–2016
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
C30BSingle-crystal growth25%
C23CCoating metallic material19%
H10DInorganic electric semiconductor devices13%
H01LSemiconductor devices6%
H10HInorganic light-emitting semiconductor devices having potential barriers6%
PatentTitleYear
9,287,121'SIC epitaxial wafer and method for manufacturing same'20168,823,015'Silicon carbide epitaxial wafer and manufacturing method therefor'20148,716,718'Epitaxial SiC single crystal substrate and method of manufacture of epitaxial SiC single crystal substrate'20148,293,623'Epitaxial SiC single crystal substrate and method of manufacture of epitaxial SiC single crystal substrate'20127,498,612'Compound semiconductor light-emitting device having pn-junction type hetero structure and forming method thereof'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2016Patents assigned to SHOWA DENKO KK (5)· patent assignee history
2009–2016Based in Chichibu, JP· patent location history
2012–2016Patents assigned to MOMOSE KENJI (4)· patent assignee history
2012–2016Patents assigned to ODAWARA MICHIYA (4)· patent assignee history
2012–2014Patents assigned to CENTRAL RES INST ELECT (2)· patent assignee history
2012–2014Patents assigned to ISHIDA YUUKI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHOWA DENKO KK52009–2016
MOMOSE KENJI42012–2016
ODAWARA MICHIYAself42012–2016
CENTRAL RES INST ELECT22012–2014
ISHIDA YUUKI22012–2014
Locations
LocationPatentsSpan
Chichibu, JP52009–2016