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Inventor

KAZUMASA WAKIYA

Inventor
JP

Overview

2→
Patents
2022–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
C11DDetergent compositions25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
PatentTitleYear
12,593,639Method for processing substrate, chemical solution, and method for providing chemical solution202611,441,101Cleaning composition, cleaning method, and method for manufacturing semiconductor2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
2022Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history
2022–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD22022–2026
TOKYO ELECTRON LTD12022
Locations
LocationPatentsSpan
JP22022–2026