Inventor
Babak Radi
Inventor
Hsinchu, TW
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Kprimary
H05KPrinted circuits25%
H01LSemiconductor devices13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
C23CCoating metallic material8%
C25DProcesses for the electrolytic or electrophoretic production of coatings8%
H01QAntennas, i.e. radio aerials8%
Y10TTechnical subjects covered by former us classification8%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
G06FElectric digital data processing4%
PatentTitleYear
10,383,254Electronic device201910,087,527Method of fabricating substrate structure and substrate structure fabricated by the same method20189,997,839Metal pattern on electromagnetic absorber structure20189,790,609'Manufacturing method of substrate structure, substrate structure and metal component'20179,657,404'Method of forming metallic pattern on polymer substrate'20179,595,754'Patterned conductive structure and method for forming the same'20179,462,699'Method of forming metallic pattern on polymer substrate'20169,385,084'Metal pattern structure having positioning layer'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2019Patents assigned to WISTRON NEWEB CORP (8)· patent assignee history
2016–2019Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| WISTRON NEWEB CORP | 8 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 8 | 2016–2019 |