Inventor
Yusuke Sato
Inventor
Tokyo, JP
Overview
Patents· 51 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
F16FSprings4%
G02BOptical elements, systems or apparatus4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H01LSemiconductor devices4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
C01GCompounds containing metals not covered by subclasses c01d or c01f3%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%
C22BProduction and refining of metals3%
PatentTitleYear
11,017,949Multi-layer ceramic capacitor and method of producing the same202110,816,317Strain sensor element202010,793,721Hydrophilic treatment coating composition and hydrophilizing treatment method202010,774,221Hydrophilic treatment coating composition and hydrophilizing treatment method202010,753,331Diaphragm damper device coiled wave spring and damper system202010,694,982Imaging apparatus, authentication processing apparatus, imaging method, authentication processing method202010,629,645Solid-state imaging device and electronic apparatus202010,577,449Phenolic-hydroxyl-group-containing novolac resin and resist film202010,563,067Hydrophilic treatment coating composition and hydrophilizing treatment method202010,522,790Film member having uneven structure201910,495,041Diaphragm damper device, holding member therefor, and production method for diaphragm damper device201910,495,042Diaphragm damper201910,445,967Coin dispensing apparatus and checkout machine with the same201910,414,850Resin containing phenolic hydroxyl groups, and resist film201910,182,987Lipid membrane structure for intracellular delivery of siRNA201910,109,669Solid-state imaging device and electronic apparatus201810,084,928Image forming apparatus and non-transitory computer readable medium201810,047,185Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resist201810,047,186Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film20189,881,437'Money reception device'20189,883,054'Image forming apparatus and non-transitory computer readable medium'20189,834,665Glove and glove composition20179,828,457Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film20179,765,175'Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating'20179,465,334'Fixing device and image forming apparatus'20169,416,533'Damping device and vibration control apparatus for structure'20169,310,319'Device for inspecting substrate having irregular rough surface and inspection method using same'20169,122,569'Parking assist system and parking assist method'20159,059,420'Organic EL element with light extraction and light emission efficiency'20159,023,668'Method for producing substrate having concavity and convexity structure and method for producing organic EL element using the same'20159,006,383'Method for producing copolymer of diallylamine and sulfur dioxide'20158,927,056'Method of manufacturing a wire grid polarizer'20158,652,984'Dielectric ceramic composition'20148,584,820'Vibration reducing device and vibration reducing method'20138,456,800'Multilayer ceramic electronic component'20138,360,426'Medium pressurizing device and image forming apparatus'20138,147,779'Method of alkali processing substance containing arsenic'20128,110,162'Method of processing copper arsenic compound'20128,097,228'Method of processing diarsenic trioxide'20128,092,765'Method of processing non-ferrous smelting intermediates containing arsenic'20128,092,764'Method of processing non-ferrous smelting intermediate containing arsenic'20127,962,105'RF power module'20117,894,019'Wire grid polarizer and liquid crystal display device using the same'20117,783,634'Device, a program and a system for managing electronic documents'20107,778,243'Method for DTMF transfer by RTP'20107,715,949'Vibration reducing device'20107,706,756'RF power module'20107,631,907'Locking device for vehicle'20097,605,883'Wire grid polarizer and liquid crystal display device using the polarizer'20097,091,587'Semiconductor device'20065,403,631'Artificial marble sheet, method of manufacturing the same and artificial marble molding product'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2021Based in Tokyo, JP· patent location history
2012–2015Patents assigned to SATO YUSUKE (12)· patent assignee history
2012Patents assigned to FUJITA TETSUO (5)· patent assignee history
2012Patents assigned to MATSUMOTO MASAYOSHI (5)· patent assignee history
2012Patents assigned to MIKAMI HIRONOBU (5)· patent assignee history
2012Based in Akita, JP· patent location history
2013–2019Based in Yokohama, JP· patent location history
2016–2020Based in Kanagawa, JP· patent location history
2017–2020Patents assigned to DAINIPPON INK & CHEMICALS (6)· patent assignee history
2017–2020Based in Ichihara, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SATO YUSUKEself | 12 | 2012–2015 |
| DAINIPPON INK & CHEMICALS | 6 | 2017–2020 |
| FUJITA TETSUO | 5 | 2012 |
| MATSUMOTO MASAYOSHI | 5 | 2012 |
| MIKAMI HIRONOBU | 5 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 14 | 2009–2021 |
| Yokohama, JP | 6 | 2013–2019 |
| Ichihara, JP | 5 | 2017–2020 |
| Kanagawa, JP | 4 | 2016–2020 |
| Akita, JP | 4 | 2012 |