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Inventor

Lung-Yi Cheng

Inventor
Taipei, TW

Overview

2→
Patents
2001–2002
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1067%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
PatentTitleYear
6,410,447'Process for removing photoresist material'20026,194,324'Method for in-situ removing photoresist material'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to UNITED MICROELECTRONICS CORP (1)· patent assignee history
2001–2002Based in Taipei, TW· patent location history
2002Patents assigned to UNITED MICROELECTRONICS CROP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNITED MICROELECTRONICS CORP12001
UNITED MICROELECTRONICS CROP12002
Locations
LocationPatentsSpan
Taipei, TW22001–2002