Inventor

Brian K. Hatcher

Inventor

San Jose, CA, US

Overview

2002–2014

Patent span

Electricity

Primary field (CPC H)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps42%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%

C23CCoating metallic material12%

B08BCleaning in general4%

C04BLime, magnesia4%

G05FSystems for regulating electric or magnetic variables4%

H02JElectric power networks4%

H03HImpedance networks, e.g. resonant circuits4%

H05HPlasma technique4%

H10DInorganic electric semiconductor devices4%

PatentTitleYear

8,858,766'Combinatorial high power coaxial switching matrix'2014 8,236,133'Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias'2012 8,066,895'Method to control uniformity using tri-zone showerhead'2011 8,017,526'Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process'2011 7,780,864'Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution'2010 7,777,152'High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck'2010 7,727,413'Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density'2010 7,674,394'Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution'2010 7,645,357'Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency'2010 7,264,688'Plasma reactor apparatus with independent capacitive and toroidal plasma sources'2007 6,379,575'Treatment of etching chambers using activated cleaning gas'2002 6,367,410'Closed-loop dome thermal control apparatus for a semiconductor wafer processing system'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2012Patents assigned to APPLIED MATERIALS INC (11)· patent assignee history

2002–2014Based in San Jose, CA, US· patent location history

2011–2014Patents assigned to HATCHER BRIAN K (3)· patent assignee history

2011–2012Patents assigned to BELEN RODOLFO P (2)· patent assignee history

2011–2012Patents assigned to HAMMOND IV EDWARD P (2)· patent assignee history

2011–2012Patents assigned to KATZ DAN (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	11	2002–2012
HATCHER BRIAN Kself	3	2011–2014
BELEN RODOLFO P	2	2011–2012
HAMMOND IV EDWARD P	2	2011–2012
KATZ DAN	2	2011–2012

Locations

Location	Patents	Span
San Jose, California, US	12	2002–2014