Inventor
HIDEAKI SAKURAI
Inventor
JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Bprimary
H01BCables12%
H01LSemiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
H01FMagnets8%
B08BCleaning in general7%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
C25DProcesses for the electrolytic or electrophoretic production of coatings7%
C08LCompositions of macromolecular compounds5%
PatentTitleYear
12,575,385Etching method, etching apparatus, manufacturing method of semiconductor device, and manufacturing method of template202612,573,596Plasma treatment apparatus, plasma treatment method, and original plate manufacturing method202612,278,025Insulated copper wire and electric coil202511,931,923Method of manufacturing template and method of forming pattern202411,789,365Substrate processing method and substrate processing apparatus202311,682,566Processing apparatus for processing substrates of different types202311,651,953Method for cleaning substrate and cleaning device202311,581,127Insulated electric wire, production method therefor, coil and coil production method using same202311,555,254Insulated conductor and insulated conductor manufacturing method202311,493,846Pattern forming method and template manufacturing method202211,450,452Insulated flat rectangular conductor, coil, and method of producing insulated flat rectangular conductor202211,430,585Insulated conductor and insulated conductor manufacturing method202211,286,576Electrodeposition solution and method for producing conductor with insulating film using same202211,264,233Method for cleaning substrate and substrate processing apparatus202211,230,788Electrodeposition liquid and electrodeposition-coated article202211,185,895Substrate processing method, substrate processing apparatus, and composite processing apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to TOSHIBA MEMORY CORP (1)· patent assignee history
2021–2026Based in JP· patent location history
2022–2026Patents assigned to KIOXIA CORP (8)· patent assignee history
2022–2025Patents assigned to MITSUBISHI MATERIALS CORP (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KIOXIA CORP | 8 | 2022–2026 |
| MITSUBISHI MATERIALS CORP | 7 | 2022–2025 |
| TOSHIBA MEMORY CORP | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 16 | 2021–2026 |