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Inventor

Aloysius T. Pfeiffer

Inventor
Peekskill, NY, US

Overview

4→
Patents
1977–1982
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
C23FNon-mechanical removal of metallic material from surface8%
G11BInformation storage based on relative movement between record carrier and transducer8%
H05KPrinted circuits8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
4,315,985'Fine-line circuit fabrication and photoresist application therefor'19824,281,057'Variable pre-spin drying time control of photoresists thickness'19814,080,267'Method for forming thick self-supporting masks'19784,022,927'Methods for forming thick self-supporting masks'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1982Patents assigned to IBM (4)· patent assignee history
1977–1982Based in Peekskill, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM41977–1982
Locations
LocationPatentsSpan
Peekskill, New York, US41977–1982