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Inventor

Renshun You

Inventor
Shanghai, CN

Overview

1→
Patents
2012
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G03HHolographic processes or apparatus33%
PatentTitleYear
8,334,082'Sensitive liquid crystalline polymeric material suitable for reflective hologram recording and the preparing method thereof'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012Patents assigned to GAO YUN (1)· patent assignee history
2012Patents assigned to SHANGHAI TECHSUN ANTI COUNTERFEITING TECHNOLOGY HOLDING CO LTD (1)· patent assignee history
2012Patents assigned to XU LIANGHENG (1)· patent assignee history
2012Patents assigned to XU XUEWEN (1)· patent assignee history
2012Patents assigned to YANG KAI (1)· patent assignee history
2012Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GAO YUN12012
SHANGHAI TECHSUN ANTI COUNTERFEITING TECHNOLOGY HOLDING CO LTD12012
XU LIANGHENG12012
XU XUEWEN12012
YANG KAI12012
Locations
LocationPatentsSpan
Shanghai, CN12012