Inventor
WEN YI TAN
Inventor
CN
Overview
Patents· 45 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10DInorganic electric semiconductor devices14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H10BElectronic memory devices5%
H10NElectric solid-state devices not otherwise provided for5%
C23CCoating metallic material2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
B24BMachines, devices, or processes for grinding or polishing2%
PatentTitleYear
12,593,624Resistive random access memory structure and manufacturing method thereof202612,588,444Method for forming a semiconductor structure202612,568,675Manufacturing method of semiconductor structure202612,560,555Method for aligning to a pattern on a wafer202612,557,606Semiconductor test key including strip arranged resistor patterns202612,538,738Semiconductor process machine and operation method thereof202612,443,178Machine monitoring system and machine monitoring method202512,427,548Cleaning process of wafer polishing pad and cleaning nozzle202512,432,997Method for forming an epitaxial layer with better quality202512,416,866Overlay mark202512,394,673Semiconductor manufacturing process202512,356,677Semiconductor device and method for fabricating the same202512,276,020Semiconductor cleaning step202512,216,072Reticle thermal expansion calibration method capable of improving sub-recipe202512,219,886Resistive memory device202512,213,391Resistive random access memory and method of forming the same202512,204,247Lithography film stack and lithography method202512,191,211Method for making semiconductor device using a stress memorization technique202512,191,171Apparatus for thermally processing a substrate202512,191,377Method for forming a semiconductor structure202512,094,820Semiconductor device having inter-metal dielectric patterns and method for fabricating the same202412,094,790Testkey structure for semiconductor device202412,087,687Semiconductor device and fabrication method thereof202412,040,189Method of removing hard mask layer202412,020,932Photoresist coating method202411,955,536Semiconductor transistor structure and fabrication method thereof202411,804,403Semiconductor structure and method for forming the same202311,778,930Manufacturing method of resistive memory device202311,749,601Semiconductor device having inter-metal dielectric patterns and method for fabricating the same202311,737,381Resistive random access memory and method of forming the same202311,721,599Semiconductor testkey pattern and test method thereof202311,692,946Method for aligning to a pattern on a wafer202311,658,229Semiconductor device and method for fabricating the same202311,637,183Method of forming a semiconductor transistor having an epitaxial channel layer202311,610,821Method for forming a semiconductor device involving the use of stressor layer202311,527,438Manufacturing method of contact structure202211,494,475Safety system for cleanroom and operation method thereof202211,397,425CMP polishing system and associated pilot management system202211,387,150Fabricating method of decreasing height difference of STI202211,380,627Radiofrequency device202211,289,575Semiconductor transistor having epitaxial channel layer202211,283,013Resistive memory device and manufacturing method thereof202211,245,000Metal-insulator-metal capacitor202211,222,785Method for depositing a metal layer on a wafer202211,201,116Semiconductor device having inter-metal dielectric patterns and method for fabricating the same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to UNITED SEMICONDUCTOR XIAMEN CO LTD (45)· patent assignee history
2021–2026Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED SEMICONDUCTOR XIAMEN CO LTD | 45 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| CN | 45 | 2021–2026 |