Inventor
ERROL ANTONIO C. SANCHEZ
Inventor
US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices20%
C23CCoating metallic material15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C30BSingle-crystal growth11%
H10DInorganic electric semiconductor devices5%
B23KSoldering or unsoldering2%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
C01BNon-metallic elements2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
PatentTitleYear
12,571,101Multi-level injector with angled gas outlet for semiconductor epitaxy growth202612,540,400Multi-flow gas circuits, processing chambers, and related apparatus and methods for semiconductor manufacturing202612,467,144Methods of correlating zones of processing chambers, and related systems and methods202512,454,769Multizone lamp control and individual lamp control in a lamphead202512,449,309Methods for detection using optical emission spectroscopy202512,338,547Method for forming silicon-phosphorous materials202512,196,617Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber202512,170,196Methods and systems for cleaning high aspect ratio structures202412,163,229Multi zone spot heating in EPI202412,091,749Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet202412,018,372Gas injector for epitaxy and CVD chamber202412,015,042Structure and material engineering methods for optoelectronic devices signal to noise ratio enhancement202411,901,182Silicide film nucleation202411,860,973Method and system for foreline deposition diagnostics and control202411,821,088Multi zone spot heating in EPI202311,733,081Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system202311,649,560Method for forming silicon-phosphorous materials202311,482,432Method and apparatus for semiconductor processing202211,411,039Stacked pixel structure formed using epitaxy202211,322,649Three color light sources integrated on a single wafer202211,145,761Horizontal gate all around and FinFET device isolation2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (21)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 21 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 21 | 2021–2026 |