Inventor
Shih-Chia Chang
Inventor
Troy, MI, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties18%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
H05KPrinted circuits8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
Y10TTechnical subjects covered by former us classification8%
C04BLime, magnesia5%
G01DMeasuring not specially adapted for a specific variable5%
H01FMagnets5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
PatentTitleYear
8,865,093'Polymorph, polymorph screening system, and polymorph preparing and screening method'20148,263,970'Optical device having solvate and manufacturing method thereof'20127,411,290'Integrated circuit chip and method for cooling an integrated circuit chip'20087,229,746'Printed high strength permanent magnet targets for magnetic sensors'20077,215,547'Integrated cooling system for electronic devices'20077,062,840'Method for forming permanent magnet targets for position sensors'20066,809,436'Microactuator having a ferromagnetic substrate'20046,054,659'Integrated electrostatically-actuated micromachined all-metal micro-relays'20005,233,874'Active microaccelerometer'19934,901,570'Resonant-bridge two axis microaccelerometer'19904,851,080'Resonant accelerometer'19894,805,456'Resonant accelerometer'19894,778,562'Reactive ion etching of tin oxide films using neutral reactant gas containing hydrogen'19884,752,501'Method for forming patterned tin oxide thin film element'19884,706,493'Semiconductor gas sensor having thermally isolated site'19874,544,444'Reactive ion etching of tin oxide films using silicon tetrachloride reactant gas'19854,358,951'Zinc oxide thin film sensor having improved reducing gas sensitivity'19824,358,950'Detecting NO.sub.x using thin film zinc oxide semiconductor'19824,169,369'Method and thin film semiconductor sensor for detecting NO.sub.x'19794,030,340'Hydrogen gas detector'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977Based in Santa Ana, CA, US· patent location history
1979–2000Patents assigned to GEN MOTORS CORP (10)· patent assignee history
1979–1989Based in Troy, MI, US· patent location history
1989Patents assigned to MASSACHUSETTS INST TECHNOLOGY (2)· patent assignee history
1990–2008Based in Bloomfield Hills, MI, US· patent location history
2004–2008Patents assigned to DELPHI TECH INC (5)· patent assignee history
2012–2014Patents assigned to CHANG SHIH-CHIA (2)· patent assignee history
2012–2014Patents assigned to LEE TU (2)· patent assignee history
2012–2014Based in Jhubei City, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GEN MOTORS CORP | 10 | 1979–2000 |
| DELPHI TECH INC | 5 | 2004–2008 |
| CHANG SHIH-CHIAself | 2 | 2012–2014 |
| LEE TU | 2 | 2012–2014 |
| MASSACHUSETTS INST TECHNOLOGY | 2 | 1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Troy, MI, US | 9 | 1979–1989 |
| Bloomfield Hills, MI, US | 8 | 1990–2008 |
| Jhubei City, TW | 2 | 2012–2014 |
| Santa Ana, California, US | 1 | 1977 |