Inventor
Won-Kyu Park
Inventor
Cheonan-si, KR
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
C03BManufacture, shaping, or supplementary processes6%
A01CPlanting3%
B21CManufacture of metal sheets, wire, rods, tubes, profiles or like semi-manufactured products otherwise than by rolling3%
B23KSoldering or unsoldering3%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors3%
F16CShafts3%
F16MFrames, casings or beds of engines, machines or apparatus, not specific to engines, machines or apparatus provided for elsewhere3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
PatentTitleYear
11,038,353Apparatus and method for controlling output of energy storage apparatus for reliability of output of photovoltaic power generation202110,306,789Display apparatus20199,885,381'Extrusion-type connecting rod, extrusion apparatus for connecting rod and manufacturing method for extrusion-type connecting rod'20188,999,825'Method of healing defect at junction of semiconductor device using germanium'20158,944,304'Breaking apparatus for glass substrate'20158,766,135'Glass substrate laser cutting device with real-time breaking detecting function and glass substrate breakage detecting method thereof'20146,855,600'Method for manufacturing capacitor'20056,623,988'Method for fabricating ferroelectric capacitor of semiconductor device'20036,619,219'Garlic upright-positioning and planting device'20036,583,915'Display device using a micro light modulator and fabricating method thereof'20036,569,721'Method of manufacturing a thin film transistor to reduce contact resistance between a drain region and an interconnecting metal line'20036,458,636'Method for forming polycrystalline silicon layer and method for fabricating thin film transistor'20026,338,987'Method for forming polycrystalline silicon layer and method for fabricating thin film transistor'20026,326,286'Method for crystallizing amorphous silicon layer'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2003Patents assigned to LG PHILIPS LCD CO LTD (5)· patent assignee history
2002Based in Yongin-si, KR· patent location history
2003–2005Patents assigned to HYNIX SEMICONDUCTOR INC (2)· patent assignee history
2014–2015Patents assigned to KIM SUNG CHEAL (2)· patent assignee history
2014–2015Patents assigned to KOO JA-YONG (2)· patent assignee history
2014–2015Patents assigned to LEE CHANG-HA (2)· patent assignee history
2014–2015Based in Cheonan-si, KR· patent location history
2018Based in Chungcheongnam-do, KR· patent location history
2019Based in Suwon-si, KR· patent location history
2021Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG PHILIPS LCD CO LTD | 5 | 2001–2003 |
| HYNIX SEMICONDUCTOR INC | 2 | 2003–2005 |
| KIM SUNG CHEAL | 2 | 2014–2015 |
| KOO JA-YONG | 2 | 2014–2015 |
| LEE CHANG-HA | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Cheonan-si, KR | 2 | 2014–2015 |
| Yongin-si, KR | 2 | 2002 |
| Daejeon, KR | 1 | 2021 |
| Suwon-si, KR | 1 | 2019 |
| Chungcheongnam-do, KR | 1 | 2018 |