Inventor

Takeshi Hioki

Inventor

Osaka, JP

Overview

20→

Patents

1988–2007

Patent span

Physics

Primary field (CPC G)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%

C07CAcyclic or carbocyclic compounds24%

C07DHeterocyclic compounds10%

G11BInformation storage based on relative movement between record carrier and transducer10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium7%

B41MPrinting, duplicating, marking, or copying processes2%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%

G03CPhotosensitive materials for photographic purposes2%

PatentTitleYear

7,264,912'Method of producing photoresist'2007 5,861,229'Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound'1999 5,792,585'Radiation-sensitive positive resist composition'1998 5,783,355'Radiation-sensitive positive resist composition'1998 5,736,292'Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups'1998 5,456,995'Radiation-sensitive positive resist composition'1995 5,456,996'Radiation-sensitive positive resist composition'1995 5,407,780'Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde'1995 5,403,696'Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol'1995 5,354,644'Photoresist compositions comprising styryl compound'1994 5,220,027'Sulfone-containing azamethide compounds with a nitrogen-containing aromatic ring of nitrogen containing aliphatic'1993 5,218,136'Styryl compounds, process for preparing the same and photoresist compositions comprising the same'1993 5,198,323'Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component'1993 5,188,920'Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound'1993 5,136,054'Sulfone-containing azamethine compounds'1992 5,080,997'Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture'1992 5,077,264'Cyan dye-donor element used in thermal transfer and thermal transfer sheet using it'1991 5,061,796'Azamethine compounds'1991 5,028,708'Azamethinyl quinoline derivatives'1991 4,769,494'Process for producing O,O-di-lower-alkylchlorothiophosphate'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2007Patents assigned to SUMITOMO CHEMICAL CO (20)· patent assignee history

1988–2007Based in Osaka, JP· patent location history

1992–1999Based in Tondabayashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SUMITOMO CHEMICAL CO	20	1988–2007

Locations

Location	Patents	Span
Osaka, JP	12	1988–2007
Tondabayashi, JP	8	1992–1999