Inventor
Yuji Asano
Inventor
Nagoya, JP
Overview
Patents· 50 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices11%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
H01LSemiconductor devices8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
H04NPictorial communication, e.g. television5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
G03GElectrography3%
PatentTitleYear
10,693,013Semiconductor device and manufacturing method of the same202010,648,052Induction hardening apparatus, induction hardening method, induction heating coil, heat treatment apparatus, and heat treatment method202010,236,502Power storage device and method for manufacturing the same201910,050,060Semiconductor device and electronic device20189,941,310Driver circuit with oxide semiconductor layers having varying hydrogen concentrations20189,887,427'Fuel cell stack'20189,704,976'Semiconductor device and method for manufacturing the same'20179,698,288'Photoelectric conversion device'20179,685,275'Power storage device and method for manufacturing the same'20179,685,664'Fuel cell stack'20179,673,458'Fuel cell'20179,653,479'Semiconductor device and electronic device'20179,534,267'Induction hardening apparatus, induction hardening method, induction heating coil, heat treatment apparatus, and heat treatment method'20179,443,888'Method of manufacturing semiconductor device including transistor and resistor incorporating hydrogen in oxide semiconductor'20169,419,113'Semiconductor device and manufacturing method thereof'20169,331,344'Fuel cell'20169,202,827'Driver circuit and semiconductor device'20158,936,965'Semiconductor device and manufacturing method thereof'20158,716,061'Semiconductor device and method for manufacturing the same'20148,597,977'Semiconductor device and method for manufacturing the same'20138,378,393'Conductive oxynitride and method for manufacturing conductive oxynitride film'20138,338,827'Semiconductor device and method for manufacturing the same'20128,338,226'Method for manufacturing semiconductor device'20127,659,135'Semiconductor device fabrication method and semiconductor device'20106,846,694'Semiconductor device with built-in light receiving element, production method thereof, and optical pickup incorporating the same'20056,828,644'Semiconductor device with reduced parasitic capacitance between impurity diffusion regions'20046,531,102'Fuel reforming apparatus'20036,323,962'Facsimile machine with facsimile data receiver and external computer'20016,109,510'Brazing material for use in a low temperature brazing and method for low temperature brazing'20005,934,546'Process for brazing die-cast aluminum material'19995,881,240'Method and device for setting speed of data transmission'19995,796,493'Facsimile machine'19985,796,494'Facsimile machine connectable to an external computer'19985,761,399'Facsimile system and method for controlling facsimile system'19985,532,840'Facsimile machine'19965,122,830'Image recording apparatus having front/rear sheet face sensor'19925,089,838'Pressure developing device'19925,041,865'Image recording apparatus with exposure amount controlling capability dependent upon temperature/humidity changes'19915,023,654'Thermal fixing device for image recording apparatus'19914,982,225'Image forming apparatus for controlling the humidity and operating parameters associated with an image forming process'19914,981,433'Sheet heating device'19914,965,592'Image processing apparatus for reproducing images on projector screen and photosensitive medium'19904,945,374'Pressure developing device'19904,933,708'Image recording apparatus using microcapsules to form a color image'19904,920,374'Picture recording apparatus'19904,905,036'Image forming process and system, including heating step or device for increased density of images'19904,873,167'Self cleaning sheet for dissolving a photo-sensitive material containing microcapsules on both sides of substrate'19894,864,356'Exposure device for image recording apparatus'19894,810,614'Method of recording information on photosensitive and pressure-sensitive sheet utilizing mask original form'19894,806,984'Color-tone controlling method and apparatus therefor'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2001Patents assigned to BROTHER IND LTD (21)· patent assignee history
1989–2001Based in Nagoya, JP· patent location history
2003–2018Patents assigned to HONDA MOTOR CO LTD (5)· patent assignee history
2003–2018Based in Wako, JP· patent location history
2004–2010Based in Kawasaki, JP· patent location history
2012–2020Patents assigned to SEMICONDUCTOR ENERGY LAB (15)· patent assignee history
2012–2017Patents assigned to ASANO YUJI (7)· patent assignee history
2012–2015Patents assigned to IMOTO YUKI (4)· patent assignee history
2012–2018Based in Atsugi, JP· patent location history
2012–2020Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BROTHER IND LTD | 21 | 1989–2001 |
| SEMICONDUCTOR ENERGY LAB | 15 | 2012–2020 |
| ASANO YUJIself | 7 | 2012–2017 |
| HONDA MOTOR CO LTD | 5 | 2003–2018 |
| IMOTO YUKI | 4 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nagoya, JP | 21 | 1989–2001 |
| Atsugi, JP | 10 | 2012–2018 |
| Kanagawa, JP | 6 | 2012–2020 |
| Wako, JP | 4 | 2003–2018 |
| Kawasaki, JP | 3 | 2004–2010 |