Inventor

Junichi Horikawa

Inventor

Tokyo, JP

Overview

1988–2020

Patent span

Physics

Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary

G11BInformation storage based on relative movement between record carrier and transducer20%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%

H01LSemiconductor devices11%

C03CChemical composition of glasses, glazes or vitreous enamels9%

B82YSpecific uses or applications of nanostructures6%

G02BOptical elements, systems or apparatus6%

C23CCoating metallic material2%

G01BMeasuring length, thickness or similar linear dimensions2%

G01RMeasuring electric variables2%

PatentTitleYear

10,620,527Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method2020 10,429,728Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method2019 10,295,900Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method2019 10,025,176Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device2018 10,001,699Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method2018 9,897,909'Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method'2018 9,581,895'Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device'2017 9,507,254'Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device'2016 9,494,851'Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method'2016 9,348,217'Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method'2016 8,623,528'Method of manufacturing perpendicular magnetic recording medium and perpendicular magnetic recording medium'2014 8,559,131'Perpendicular magnetic recording media and magnetic disc apparatus'2013 8,057,926'Perpendicular magnetic recording medium'2011 7,993,765'Perpendicular magnetic recording medium'2011 7,972,662'Substrate for information recording medium, information recording medium and process for producing information recording medium'2011 7,357,998'Disk substrate for a perpendicular magnetic recording medium, perpendicular magnetic recording disk and manufacturing methods thereof'2008 7,208,238'Substrate for information recording medium, information recording medium and process for producing information recording medium'2007 6,670,055'Magnetic recording medium and manufacturing method therefor'2003 6,287,429'Magnetic recording medium having an improved magnetic characteristic'2001 5,954,927'Method of manufacturing magnetic recording medium'1999 5,746,893'Method of manufacturing magnetic recording medium'1998 5,640,089'Method and apparatus for surface roughness detection - using a magnetoresistive element'1997 4,772,904'Diaphragm drive device'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2020Patents assigned to HOYA CORP (18)· patent assignee history

1997–1999Based in Yamanashi, JP· patent location history

2001–2020Based in Tokyo, JP· patent location history

2007–2011Based in Kofu, JP· patent location history

2011–2014Patents assigned to WD MEDIA SINGAPORE PTE LTD (4)· patent assignee history

2011–2014Patents assigned to HORIKAWA JUNICHI (3)· patent assignee history

2011–2014Patents assigned to AYAMA KENJI (2)· patent assignee history

2011–2014Patents assigned to ISHIYAMA MASAFUMI (2)· patent assignee history

2011–2014Based in Singapore, SG· patent location history

2016–2018Based in Shinjuku-ku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HOYA CORP	18	1997–2020
WD MEDIA SINGAPORE PTE LTD	4	2011–2014
HORIKAWA JUNICHIself	3	2011–2014
AYAMA KENJI	2	2011–2014
ISHIYAMA MASAFUMI	2	2011–2014

Locations

Location	Patents	Span
Tokyo, JP	11	2001–2020
Shinjuku-ku, JP	4	2016–2018
Yamanashi, JP	3	1997–1999
Singapore, SG	2	2011–2014
Kofu, JP	2	2007–2011