Inventor

Christopher K. Ober

Inventor
Ithaca, NY, US

Overview

50→
Patents
1985–2018
Patent span
Chemistry
Primary field (CPC C)

Patents· 50 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
Y10TTechnical subjects covered by former us classification7%
C07CAcyclic or carbocyclic compounds7%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C08LCompositions of macromolecular compounds5%
C07DHeterocyclic compounds4%
PatentTitleYear
10,155,903Metal etchant compositions and methods of fabricating a semiconductor device using the same201810,120,277Radiation-sensitive composition and pattern-forming method20189,541,830'Block copolymers and lithographic patterning using same'20179,500,952'Orthogonal processing of organic materials used in electronic and electrical devices'20169,389,511'Methods of making patterned structures of materials, patterned structures of materials, and methods of using same'20169,259,759'Patterning of biomaterials using fluorinated materials and fluorinated solvents'20169,213,238'Orthogonal processing of organic materials used in electronic and electrical devices'20158,846,301'Orthogonal processing of organic materials used in electronic and electrical devices'20148,809,111'Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers'20148,701,469'Flexible substrate sensor system for environmental and infrastructure monitoring'20148,415,081'Photosensitive resin composition having a high refractive index'20138,268,531'Photoacid generator compounds and compositions'20128,192,843'Polymers and polymer coatings'20128,163,461'Photoacid generator compounds and compositions'20128,124,230'Non-aggregating nanoparticles and the use thereof'20127,887,790'Polymers and polymer coatings'20117,887,926'Triblock polymers and polymer coatings'20117,824,839'Photoacid generator compounds and compositions'20107,763,687'Polymers containing quaternized nitrogen'20107,709,055'Polymers with ether containing side chains and compositions thereof'20107,452,658'Molecular glass photoresists'20087,393,627'Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)'20087,326,514'Organoelement resists for EUV lithography and methods of making the same'20086,946,736'Electrical device including dielectric layer formed by direct patterning process'20056,750,296'Polymer material with stable non-wetting surface'20046,657,031'Reworkable thermosetting resin compositions'20036,509,138'Solventless, resistless direct dielectric patterning'20036,379,874'Using block copolymers as supercritical fluid developable photoresists'20026,355,702'Acyclic monomers which when cured are reworkable through thermal decomposition'20026,329,070'Fabrication of periodic surface structures with nanometer-scale spacings'20016,197,122'Compounds with substituted cyclic hydrocarbon moieties linked by secondary or tertiary oxycarbonyl containing moiety providing reworkable cured thermosets'20016,132,819'Microphase stabilized ferroelectric liquid crystals'20006,114,467'Semifluorinated acid halides and fluorinated polymers produced therefrom'20005,973,033'Compounds with substituted cyclic hydrocarbon moieties linked by secondary or tertiary oxycarbonyl containing moiety providing reworkable cured thermosets'19995,948,922'Compounds with substituted cyclic hydrocarbon moieties linked by secondary or tertiary oxycarbonyl containing moiety providing reworkable cured thermosets'19995,907,017'Semifluorinated side chain-containing polymers'19995,811,504'Liquid crystalline epoxy monomer and liquid crystalline epoxy resin containing mesogen twins'19985,773,178'Process for producing a patterned anisotropic polymeric film'19985,318,877'Bilayer resist and process for preparing same'19945,290,397'Bilayer resist and process for preparing same'19945,248,734'Process for preparing a polyphenylene polymer'19935,136,011'Triazine networks with homogeneous and oriented structures and method for making same'19924,795,794'Processes for colored particles from polymerizable dyes'19894,789,616'Processes for liquid developer compositions with high transfer efficiencies'19884,692,188'Preparation of ink jet compositions'19874,680,332'Ink jet compositions and process for preparation thereof'19874,652,508'Toner compositions with stabilizer irreversibly anchored thereto'19874,617,249'Dispersion polymerization process for toner compositions'19864,613,559'Process for colored toner compositions with controlled charges thereon'19864,524,199'Stable polymeric dispersion and methods for making'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–1989Patents assigned to XEROX CORP (8)· patent assignee history
1985–1989Based in Oakville, CA· patent location history
1988–2018Based in Ithaca, NY, US· patent location history
1992–2013Patents assigned to CORNELL RES FOUNDATION INC (27)· patent assignee history
2008–2018Patents assigned to UNIV CORNELL (13)· patent assignee history
2012–2018Patents assigned to OBER CHRISTOPHER K (9)· patent assignee history
2014–2016Patents assigned to LEE JIN-KYUN (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CORNELL RES FOUNDATION INC271992–2013
UNIV CORNELL132008–2018
OBER CHRISTOPHER Kself92012–2018
XEROX CORP81985–1989
LEE JIN-KYUN42014–2016
Locations
LocationPatentsSpan
Ithaca, New York, US431988–2018
Oakville, CA71985–1989