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Inventor

Hiromitsu Nanba

Inventor
Koshi, JP

Overview

17→
Patents
2007–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
B08BCleaning in general9%
H01LSemiconductor devices9%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
G11BInformation storage based on relative movement between record carrier and transducer6%
B05DProcesses for applying fluent materials to surfaces, in general3%
C03CChemical composition of glasses, glazes or vitreous enamels3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
C23FNon-mechanical removal of metallic material from surface3%
PatentTitleYear
10,490,424Substrate processing apparatus, substrate processing method, and storage medium201910,431,448Wet etching method, substrate liquid processing apparatus, and storage medium201910,403,518Substrate processing method, substrate processing apparatus and recording medium20198,479,753'Liquid processing apparatus and method'20138,444,772'Liquid processing apparatus'20138,152,933'Substrate processing apparatus, substrate processing method, and drain cup cleaning method'20128,113,221'Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium'20128,051,862'Liquid processing apparatus and liquid processing method'20118,043,440'Cleaning apparatus and method and computer readable medium'20118,043,467'Liquid processing apparatus and liquid processing method'20117,998,308'Liquid processing apparatus'20117,927,429'Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium'20117,793,610'Liquid processing apparatus'20107,749,333'Substrate processing apparatus and method'20107,699,939'Substrate cleaning method'20107,354,484'Liquid processing apparatus and liquid processing method'20087,275,553'Liquid processing apparatus and liquid processing method'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2019Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history
2007–2008Based in Tosu, JP· patent location history
2010–2019Based in Koshi, JP· patent location history
2012–2013Patents assigned to NANBA HIROMITSU (4)· patent assignee history
2012–2013Patents assigned to ITO NORIHIRO (2)· patent assignee history
2012Patents assigned to ORII TAKEHIKO (1)· patent assignee history
2013Patents assigned to ITOH NORIHIRO (1)· patent assignee history
2013–2019Based in Kumamoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD172007–2019
NANBA HIROMITSUself42012–2013
ITO NORIHIRO22012–2013
ITOH NORIHIRO12013
ORII TAKEHIKO12012
Locations
LocationPatentsSpan
Koshi, JP132010–2019
Kumamoto, JP22013–2019
Tosu, JP22007–2008