Inventor
HAMED HAJIBABAEINAJAFABADI
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
B82YSpecific uses or applications of nanostructures11%
H10DInorganic electric semiconductor devices11%
H01JElectric discharge tubes or discharge lamps5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
12,585,185Acid for reactive development of metal oxide resists202612,525,437Substrate bombardment with ions having targeted mass using pulsed bias phase control202612,332,568Metal oxide resists for EUV patterning and methods for developing the same202512,287,578Cyclic method for reactive development of photoresists202512,272,558Selective and isotropic etch of silicon over silicon-germanium alloys and dielectrics; via new chemistry and surface modification202512,002,683Lateral etching of silicon2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2024–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2024–2026 |