Inventor
CHIA YING LEE
Inventor
US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H10DInorganic electric semiconductor devices11%
G06TImage data processing or generation, in general5%
LOC235%
LOC285%
C04BLime, magnesia3%
C22CAlloys3%
G06FElectric digital data processing3%
PatentTitleYear
D1119318Toothbrush2026D1101933Grooming faucet202512,389,667Fin field-effect transistor device and method202512,381,081Method of breaking through etch stop layer202512,307,717Automatic camera calibration2025D1066582Faucet202512,101,699Security ecosystem, device and method for communicating with communication devices based on workflow interactions202412,072,920System and method for summarization of search results202412,040,233Fin field-effect transistor device and method202412,009,258Self-aligned interconnect with protection layer202411,923,202Double patterning method202411,901,180Method of breaking through etch stop layer2024D1013387Toothbrush floss kit202411,854,820Spacer etching process for integrated circuit design202311,840,487Ceramic materials and seals for high temperature reactive material devices2023D1002808Faucet202311,625,859Method and system for calibrating a camera and localizing objects within the camera field of view202311,580,661Device, method and system for estimating elevation in images from camera devices202311,521,857Cut first self-aligned litho-etch patterning202211,482,426Double patterning method2022D0967331Filter202211,289,759Ceramic materials and seals for high temperature reactive material devices202211,276,571Method of breaking through etch stop layer202211,177,138Double patterning method202111,170,267Method, system and computer program product for region proposals202111,164,438Systems and methods for detecting anomalies in geographic areas2021D0933367Face brush2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (11)· patent assignee history
2021–2026Patents assigned to KOHLER CHINA INVEST CO LTD (7)· patent assignee history
2021–2025Patents assigned to MOTOROLA SOLUTIONS INC (7)· patent assignee history
2021–2026Based in US· patent location history
2021–2025Based in TW· patent location history
2021–2025Based in CN· patent location history
2022–2023Patents assigned to AMBRI INC (2)· patent assignee history
2024Patents assigned to KOHER CHINA INVEST CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 11 | 2021–2025 |
| KOHLER CHINA INVEST CO LTD | 7 | 2021–2026 |
| MOTOROLA SOLUTIONS INC | 7 | 2021–2025 |
| AMBRI INC | 2 | 2022–2023 |
| KOHER CHINA INVEST CO LTD | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 11 | 2021–2026 |
| TW | 11 | 2021–2025 |
| CN | 5 | 2021–2025 |