Inventor
IGOR VLADIMIROVICH FOMENKOV
Inventor
US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
H05GX-ray technique39%
G02BOptical elements, systems or apparatus13%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
PatentTitleYear
12,389,519Guiding device and associated system202512,369,244Laser system for source material conditioning in an EUV light source202512,287,455Oxygen-loss resistant top coating for optical elements202512,171,053System for monitoring a plasma202412,078,934Laser system for target metrology and alteration in an EUV light source202411,846,887Prolonging optical element lifetime in an EUV lithography system202311,822,252Guiding device and associated system202311,340,532Prolonging optical element lifetime in an EUV lithography system202211,266,002System for monitoring a plasma2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 9 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 9 | 2022–2025 |