Inventor

Jun Hagiwara

Inventor

Tokyo, JP

Overview

1998–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Fprimary

H01FMagnets14%

Y10TTechnical subjects covered by former us classification11%

B41JTypewriters9%

C22CAlloys9%

B22FWorking metallic powder7%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%

G02BOptical elements, systems or apparatus7%

H01JElectric discharge tubes or discharge lamps5%

H02KDynamo-electric machines5%

H05BElectric heating5%

PatentTitleYear

10,726,983Rare earth magnet and motor2020 9,903,009'Rare earth magnet and method for manufacturing same'2018 9,773,599'R-T-B based sintered magnet'2017 9,514,869'R-T-B based sintered magnet'2016 9,028,981'Metal magnet and motor using the same'2015 8,436,129'Polycarbonate resin having ultraviolet absorbing capability, resin composition and optical material'2013 8,383,252'Rare earth magnet and its production method'2013 8,058,384'Method for producing thermoplastic resin, polyester resin and polycarbonate resin, and their applications'2011 8,026,336'Polycarbonate resin composition and method of producing the same'2011 7,194,109'Method and system for delivering monitored image signal of subject to be monitored'2007 6,899,916'Composite substrate, EL panel using the same, and making method'2005 6,800,322'Method of making a composite substrate'2004 6,614,460'Thermal head and method of manufacturing the same'2003 6,407,764'Thermal head and method of manufacturing the same'2002 6,344,868'Thermal head and method of manufacturing the same'2002 6,184,913'Thermal head and method of manufacturing the same'2001 5,860,844'Cold cathode electron source element and method for making'1999 5,760,536'Cold cathode electron source element with conductive particles embedded in a base'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2020Patents assigned to TDK CORP (13)· patent assignee history

1998–1999Based in Chiba, JP· patent location history

2002–2003Based in Yamanashi, JP· patent location history

2004Based in Chuo-ku, JP· patent location history

2005–2020Based in Tokyo, JP· patent location history

2007Based in Higashimurayama, JP· patent location history

2011–2018Patents assigned to HAGIWARA JUN (5)· patent assignee history

2011–2013Patents assigned to MITSUBISHI GAS CHEMICAL CO (3)· patent assignee history

2011–2013Patents assigned to KATO NORIYUKI (2)· patent assignee history

2013–2018Patents assigned to MIWA MASASHI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TDK CORP	13	1998–2020
HAGIWARA JUNself	5	2011–2018
MITSUBISHI GAS CHEMICAL CO	3	2011–2013
KATO NORIYUKI	2	2011–2013
MIWA MASASHI	2	2013–2018

Locations

Location	Patents	Span
Tokyo, JP	10	2005–2020
Yamanashi, JP	2	2002–2003
Chiba, JP	2	1998–1999
Higashimurayama, JP	1	2007
Chuo-ku, JP	1	2004