Inventor
Johanes Swenberg
Inventor
Los Gatos, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10DInorganic electric semiconductor devices19%
H01LSemiconductor devices17%
H01JElectric discharge tubes or discharge lamps10%
C23CCoating metallic material8%
H10BElectronic memory devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
C30BSingle-crystal growth2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
11,081,340Argon addition to remote plasma oxidation202110,872,763Treatments to enhance material structures20209,530,898'Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof'20169,048,190'Methods and apparatus for processing substrates using an ion shield'20159,012,336'Method for conformal treatment of dielectric films using inductively coupled plasma'20158,999,106'Apparatus and method for controlling edge performance in an inductively coupled plasma chamber'20158,993,458'Methods and apparatus for selective oxidation of a substrate'20158,871,645'Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof'20148,546,273'Methods and apparatus for forming nitrogen-containing layers'20138,481,433'Methods and apparatus for forming nitrogen-containing layers'20138,435,906'Methods for forming conformal oxide layers on semiconductor devices'20138,062,472'Method of correcting baseline skew by a novel motorized source coil assembly'20117,910,497'Method of forming dielectric layers on a substrate and apparatus therefor'20117,813,895'Methods for plasma matching between different chambers and plasma stability monitoring and control'20107,601,648'Method for fabricating an integrated gate dielectric layer for field effect transistors'20096,022,587'Method and apparatus for improving film deposition uniformity on a substrate'20006,019,839'Method and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor deposition'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2021Patents assigned to APPLIED MATERIALS INC (17)· patent assignee history
2000–2021Based in Los Gatos, CA, US· patent location history
2011–2015Patents assigned to LIU WEI (5)· patent assignee history
2011–2015Patents assigned to NGUYEN SON T (4)· patent assignee history
2011–2015Patents assigned to SWENBERG JOHANES F (3)· patent assignee history
2011Based in Los Angeles, CA, US· patent location history
2013–2014Patents assigned to SWENBERG JOHANES (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 17 | 2000–2021 |
| LIU WEI | 5 | 2011–2015 |
| NGUYEN SON T | 4 | 2011–2015 |
| SWENBERG JOHANESself | 3 | 2013–2014 |
| SWENBERG JOHANES Fself | 3 | 2011–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Los Gatos, California, US | 16 | 2000–2021 |
| Los Angeles, California, US | 1 | 2011 |