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Inventor

Andre Bernardus Jeunink

Inventor
Bergeijk, NL

Overview

48→
Patents
2004–2021
Patent span
Physics
Primary field (CPC G)

Patents· 48 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%
B82YSpecific uses or applications of nanostructures18%
B29CShaping or joining of plastics8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems1%
C09KMaterials for miscellaneous applications, not provided for elsewhere1%
C30BSingle-crystal growth1%
G01DMeasuring not specially adapted for a specific variable1%
PatentTitleYear
10,908,510Imprint lithography202110,890,851Imprint lithography202110,768,535Support apparatus, a lithographic apparatus and a device manufacturing method202010,712,678Imprint lithography apparatus and method202010,705,438Lithographic method202010,571,814Lithographic method202010,514,615Support apparatus, lithographic apparatus and device manufacturing method201910,410,914Methods for providing lithography features on a substrate by self-assembly of block copolymers201910,018,926Lithographic apparatus and method of manufacturing a lithographic apparatus20189,958,774Imprint lithography20189,915,880'Stage apparatus, lithographic apparatus and method of positioning an object table'20189,864,279'Imprint lithography'20189,658,528'Imprint lithography'20179,606,458'Method for calibration of an encoder scale and a lithographic apparatus'20179,535,322'Imprint lithography'20179,470,988'Substrate positioning system, lithographic apparatus and device manufacturing method'20169,383,659'Positioning system, lithographic apparatus and device manufacturing method'20169,377,697'Lithographic apparatus and table for use in such an apparatus'20169,372,399'Imprint lithography method and imprintable medium'20169,372,396'Imprint lithography method'20169,316,928'Stage apparatus, lithographic apparatus and method of positioning an object table'20169,116,423'Imprint lithography apparatus'20158,968,630'Imprint lithography'20158,845,320'Imprint lithography apparatus'20148,685,295'Imprint lithography apparatus'20148,529,823'Imprint lithography'20138,368,868'Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless'20138,319,968'Imprint lithography'20128,269,949'Lithographic apparatus and device manufacturing method'20128,139,217'Alignment systems and methods for lithographic systems'20128,043,085'Imprint lithography'20117,880,880'Alignment systems and methods for lithographic systems'20117,675,607'Lithographic apparatus and device manufacturing method'20107,652,749'Software upgrades in a lithographic apparatus'20107,626,684'Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus'20097,564,536'Lithographic apparatus and device manufacturing method'20097,439,531'Alignment systems and methods for lithographic systems'20087,440,079'Lithographic apparatus, alignment system, and device manufacturing method'20087,403,264'Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus'20087,332,732'Alignment systems and methods for lithographic systems'20087,329,888'Alignment systems and methods for lithographic systems'20087,297,971'Alignment systems and methods for lithographic systems'20077,262,831'Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus'20077,084,952'Lithographic apparatus, device manufacturing method, and computer-readable storage medium'20067,002,667'Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby'20066,995,831'Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure'20066,844,918'Alignment system and methods for lithographic systems using at least two wavelengths'20056,788,383'Lithographic apparatus, device manufacturing methods, and computer-readable storage medium'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2016Based in Bergeyk, NL· patent location history
2005–2021Patents assigned to ASML NETHERLANDS BV (47)· patent assignee history
2011–2021Based in Bergeijk, NL· patent location history
2012–2018Patents assigned to JEUNINK ANDRE BERNARDUS (14)· patent assignee history
2012–2018Patents assigned to KRUIJT-STEGEMAN YVONNE WENDELA (9)· patent assignee history
2012–2016Patents assigned to VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS (6)· patent assignee history
2012–2018Patents assigned to WUISTER SANDER FREDERIK (6)· patent assignee history
2015Based in Bergeik, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV472005–2021
JEUNINK ANDRE BERNARDUSself142012–2018
KRUIJT-STEGEMAN YVONNE WENDELA92012–2018
VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS62012–2016
WUISTER SANDER FREDERIK62012–2018
Locations
LocationPatentsSpan
Bergeijk, NL262011–2021
Bergeyk, NL212004–2016
Bergeik, NL12015