Inventor

Fumihiko Matsuno

Inventor

Tokyo, JP

Overview

19→

Patents

1998–2014

Patent span

Physics

Primary field (CPC G)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Fprimary

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein61%

H01JElectric discharge tubes or discharge lamps13%

G02BOptical elements, systems or apparatus9%

H10DInorganic electric semiconductor devices9%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%

PatentTitleYear

8,748,891'Manufacturing process of liquid crystal display device, and liquid crystal display device'2014 8,373,830'Liquid crystal display device'2013 7,751,022'Liquid crystal display device and method of fabricating the same'2010 7,570,326'Semi-transmissive type liquid-crystal display device and method of fabricating the same'2009 7,522,254'Liquid crystal display device and method of fabricating the same'2009 7,245,337'Liquid crystal display'2007 7,196,755'Reflector and reflection-type LCD device using the same'2007 7,110,070'Active-matrix addressed reflective LCD and method of fabricating the same'2006 7,092,051'Reflection-type LCD device using the same'2006 7,015,995'Liquid crystal display having undulated anisotropic reflection electrodes and openings therein'2006 6,977,698'Liquid crystal display'2005 6,943,856'Reflection plate, reflection type liquid crystal display apparatus, and method of manufacturing the same'2005 6,937,302'Liquid crystal display device with particular smoothed insulating layer and method of fabricating the same'2005 6,862,057'Active-matrix addressed reflective LCD and method of fabricating the same'2005 6,600,172'Image sensor and method of fabricating the same'2003 6,437,370'Image sensor structure and manufacturing process therefor'2002 6,091,188'Field emission cold cathode and method of fabricating the same'2000 5,969,467'Field emission cathode and cleaning method therefor'1999 5,787,337'Method of fabricating a field-emission cold cathode'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2005Patents assigned to NEC CORP (7)· patent assignee history

1998–2013Based in Tokyo, JP· patent location history

2005–2010Patents assigned to NEC LCD TECHNOLOGIES LTD (11)· patent assignee history

2009–2014Based in Kanagawa, JP· patent location history

2013–2014Patents assigned to MATSUNO FUMIHIKO (2)· patent assignee history

2013–2014Patents assigned to NLT TECHNOLOGIES LTD (2)· patent assignee history

2013Patents assigned to IKENO HIDENORI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NEC LCD TECHNOLOGIES LTD	11	2005–2010
NEC CORP	7	1998–2005
MATSUNO FUMIHIKOself	2	2013–2014
NLT TECHNOLOGIES LTD	2	2013–2014
IKENO HIDENORI	1	2013

Locations

Location	Patents	Span
Tokyo, JP	17	1998–2013
Kanagawa, JP	2	2009–2014