Inventor

Gregor Edward Van Baars

Inventor

Eindhoven, NL

Overview

2007–2018

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%

B29CShaping or joining of plastics13%

B82YSpecific uses or applications of nanostructures13%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light13%

G01NInvestigating or analysing materials by determining their chemical or physical properties13%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2007–2018Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history

2007–2018Based in Eindhoven, NL· patent location history

2016–2018Patents assigned to RENKENS MICHAEL JOZEF MATHIJS (2)· patent assignee history

2016–2018Patents assigned to VAN BAARS GREGOR EDWARD (2)· patent assignee history

2016Patents assigned to BENSCHOP JOZEF PETRUS HENRICUS (1)· patent assignee history

2018Patents assigned to DE FOCKERT GEORGE ARIE JAN (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	3	2007–2018
RENKENS MICHAEL JOZEF MATHIJS	2	2016–2018
VAN BAARS GREGOR EDWARDself	2	2016–2018
BENSCHOP JOZEF PETRUS HENRICUS	1	2016
DE FOCKERT GEORGE ARIE JAN	1	2018

Locations

Location	Patents	Span
Eindhoven, NL	3	2007–2018