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Inventor

Takashi Miyamatsu

Inventor
Tokyo, JP

Overview

2→
Patents
2008–2009
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
C07DHeterocyclic compounds25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
PatentTitleYear
7,580,111'Liquid for immersion exposure and immersion exposure method'20097,371,503'Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2009Patents assigned to JSR CORP (2)· patent assignee history
2008–2009Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP22008–2009
Locations
LocationPatentsSpan
Tokyo, JP22008–2009