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Inventor

Ralf Holmann

Inventor
San Jose, CA, US

Overview

1→
Patents
2001
Patent span
Electricity
Primary field (CPC H)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H01JElectric discharge tubes or discharge lamps33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,217,718'Method and apparatus for reducing plasma nonuniformity across the surface of a substrate in apparatus for producing an ionized metal plasma'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2001Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC12001
Locations
LocationPatentsSpan
San Jose, California, US12001