Inventor
Derek Coon
Inventor
Redwood City, CA, US
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G02BOptical elements, systems or apparatus2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
PatentTitleYear
9,618,852'Immersion lithography fluid control system regulating flow velocity of gas based on position of gas outlets'20179,329,492'Apparatus and method to control vacuum at porous material using multiple porous materials'20169,217,933'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20159,176,394'Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate'20158,934,080'Apparatus and methods for recovering fluid in immersion lithography'20158,797,500'Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface'20148,743,343'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20148,634,055'Apparatus and method to control vacuum at porous material using multiple porous materials'20148,610,873'Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate'20138,497,973'Immersion lithography fluid control system regulating gas velocity based on contact angle'20138,477,284'Apparatus and method to control vacuum at porous material using multiple porous materials'20138,400,610'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20138,289,497'Apparatus and methods for recovering fluid in immersion lithography'20128,237,911'Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine'20128,102,501'Immersion lithography fluid control system using an electric or magnetic field generator'20128,068,209'Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool'20117,903,233'Offset partial ring seal in immersion lithographic system'20117,745,079'Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment'20107,591,561'Liquid cooled mirror for use in extreme ultraviolet lithography'20097,576,833'Gas curtain type immersion lithography tool using porous material for fluid removal'20097,532,309'Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid'20097,339,650'Immersion lithography fluid control system that applies force to confine the immersion liquid'20086,847,431'Method and device for controlling fluid flow in an optical assembly'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2017Patents assigned to NIKON CORP (23)· patent assignee history
2005–2017Based in Redwood City, CA, US· patent location history
2011–2017Patents assigned to COON DEREK (12)· patent assignee history
2011–2015Patents assigned to KHO LEONARD WAI FUNG (6)· patent assignee history
2011–2015Patents assigned to POON ALEX KA TIM (6)· patent assignee history
2012–2015Patents assigned to KESWANI GAURAV (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 23 | 2005–2017 |
| COON DEREKself | 12 | 2011–2017 |
| KESWANI GAURAV | 6 | 2012–2015 |
| KHO LEONARD WAI FUNG | 6 | 2011–2015 |
| POON ALEX KA TIM | 6 | 2011–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Redwood City, California, US | 23 | 2005–2017 |