Inventor
Kurt A. Olson
Inventor
Sebastopol, CA, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H01JElectric discharge tubes or discharge lamps10%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
H10DInorganic electric semiconductor devices8%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
C08JWorking-up5%
C08LCompositions of macromolecular compounds5%
B29CShaping or joining of plastics3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering3%
PatentTitleYear
11,028,279Coreactive materials and methods for three-dimensional printing202110,987,697Multi-layer curable compositions containing 1,1-di-activated vinyl compound products and related processes202110,982,105Methods for reactive three-dimensional printing by extrusion202110,888,821Method for treating a microporous membrane202110,890,561Complex impedance moisture sensor and sensing method202110,882,928Treated fillers, compositions containing same, and articles prepared therefrom202110,882,927Treated fillers, compositions containing same, and articles prepared therefrom20217,439,188'Reactor with heated and textured electrodes and surfaces'20087,223,699'Plasma etch reactor and method'20076,905,969'Plasma etch reactor and method'20056,774,046'Method for minimizing the critical dimension growth of a feature on a semiconductor wafer'20046,620,335'Plasma etch reactor and method'20036,500,314'Plasma etch reactor and method'20026,354,240'Plasma etch reactor having a plurality of magnets'20026,046,116'Method for minimizing the critical dimension growth of a feature on a semiconductor wafer'20005,548,470'Characterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996Patents assigned to IBM (1)· patent assignee history
1996–2007Based in Sebastopol, CA, US· patent location history
2000–2008Patents assigned to TEGAL CORP (8)· patent assignee history
2008Based in Novato, CA, US· patent location history
2021Patents assigned to PPG IND OHIO INC (7)· patent assignee history
2021Patents assigned to UT BATTELLE LLC (1)· patent assignee history
2021Based in Gibsonia, PA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TEGAL CORP | 8 | 2000–2008 |
| PPG IND OHIO INC | 7 | 2021 |
| IBM | 1 | 1996 |
| UT BATTELLE LLC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sebastopol, California, US | 8 | 1996–2007 |
| Gibsonia, Pennsylvania, US | 7 | 2021 |
| Novato, California, US | 1 | 2008 |