LexDanaLexDanabeta
Inventor

Chien-Ting Lin

Inventor
Hsinchu, TW

Overview

126→
Patents
1997–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 126 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices32%
H01LSemiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
F16MFrames, casings or beds of engines, machines or apparatus, not specific to engines, machines or apparatus provided for elsewhere2%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
H10BElectronic memory devices2%
F21VFunctional features or details of lighting devices or systems thereof2%
F16BDevices for fastening or securing constructional elements or machine parts together, e.g. nails, bolts, circlips, clamps, clips or wedges1%
G06FElectric digital data processing1%
PatentTitleYear
D0897828Clamp for poles2020D08963013-way tripod head202010,727,397Magnetoresistive random access memory cell202010,707,135Method for fabricating semiconductor device202010,612,720Tripod assembly202010,537,939Method of manufacturing a honeycomb structure for an electronic device202010,465,838Tripod with connecting components201910,344,787Side lock sleeve assembly201910,331,165Hinge assembly including an elastomer member201910,288,102Fastening device having a tubular sleeve member for mounting on a tube or immobilizing two telescopically connected tubes201910,203,083Lamp shade201910,178,309Method for manufacturing the semiconductor structure201910,062,770Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof201810,021,298Semiconductor structure and method for manufacturing the same20189,983,622Method of applying a transfer film to metal surfaces20189,847,403Semiconductor device and a fabrication method thereof20179,831,133Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate20179,825,144'Semiconductor device having metal gate structure'20179,799,769'Semiconductor device and method for fabricating the same'20179,673,100'Semiconductor device having contact plug in two dielectric layers and two etch stop layers'20179,640,095'Photography light panel reflector clamp'20179,627,268'Method for fabricating semiconductor device'20179,601,600'Processes for fabricating FinFET structures with semiconductor compound portions formed in cavities and extending over sidewall spacers'20179,583,600'Semiconductor device and method for fabricating the same'20179,553,026'Semiconductor device and method for fabricating the same'20179,552,978'Method of decreasing fin bending'20179,536,792'Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof'20179,530,778'Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate'2016D0775411'Lamp holder'20169,530,862'Semiconductor device having metal gate and manufacturing method thereof'20169,523,904'Light cover with x-shaped structure'20169,508,715'Semiconductor structure'20169,464,650'Fastening device having a tubular sleeve member for mounting on a tube or immobilizing two telescopically connected tubes'20169,455,194'Method for fabricating semiconductor device'20169,455,176'Manufacturing method for forming semiconductor structure with sub-fin structures'20169,453,636'Lighting structure'20169,384,962'Oxygen treatment of replacement work-function metals in CMOS transistor gates'20169,379,026'Fin-shaped field-effect transistor process'20169,318,490'Semiconductor structure and manufacturing method thereof'20169,318,609'Semiconductor device with epitaxial structure'20169,312,365'Manufacturing method of non-planar FET'20169,306,032'Method of forming self-aligned metal gate structure in a replacement gate process using tapered interlayer dielectric'20169,263,540'Metal gate structure'20169,263,287'Method of forming fin-shaped structure'20169,209,273'Method of fabricating metal gate structure'20159,196,542'Method for manufacturing semiconductor devices'20159,196,546'Metal gate transistor'20159,196,500'Method for manufacturing semiconductor structures'20159,166,024'FinFET structure with cavities and semiconductor compound portions extending laterally over sidewall spacers'20159,159,626'FinFET and fabricating method thereof'20159,159,798'Replacement gate process and device manufactured using the same'20159,151,472'Light cover capable of adjusting the amount of light emitted'20159,147,612'Method for forming a semiconductor structure'20159,129,985'Semiconductor device having metal gate and manufacturing method thereof'20159,105,685'Method of forming shallow trench isolation structure'20159,105,623'Semiconductor device having metal gate and manufacturing method thereof'20159,093,477'Implantation processing step for a recess in finFET'20159,076,870'Method for forming fin-shaped structure'20159,070,710'Semiconductor process'20159,054,187'Semiconductor structure'20159,034,102'Method of fabricating hybrid orientation substrate and structure of the same'20159,024,393'Manufacturing method for semiconductor device having metal gate'20159,018,066'Method of fabricating semiconductor device structure'20159,006,091'Method of forming semiconductor device having metal gate'20159,006,072'Method of forming metal silicide layer'20158,999,830'Semiconductor device having metal gate and manufacturing method thereof'20158,993,384'Semiconductor device and fabrication method thereof'20158,987,096'Semiconductor process'20158,981,487'Fin-shaped field-effect transistor (FinFET)'20158,952,451'Semiconductor device having metal gate and manufacturing method thereof'20158,895,396'Epitaxial Process of forming stress inducing epitaxial layers in source and drain regions of PMOS and NMOS structures'20148,877,623'Method of forming semiconductor device'20148,872,280'Non-planar FET and manufacturing method thereof'20148,853,013'Method for fabricating field effect transistor with fin structure'20148,841,197'Method for forming fin-shaped structures'2014D0712590'Lamp holder'20148,816,439'Gate structure of semiconductor device'20148,802,524'Method of manufacturing semiconductor device having metal gates'20148,779,513'Non-planar semiconductor structure'20148,748,278'Method for fabricating semiconductor device'20148,722,501'Method for manufacturing multi-gate transistor device'20148,704,294'Semiconductor device having metal gate and manufacturing method thereof'20148,691,651'Method of forming non-planar FET'20148,685,811'Method for manufacturing a CMOS device having dual metal gate'20148,669,618'Manufacturing method for semiconductor device having metal gate'20148,664,060'Semiconductor structure and method of fabricating the same'20148,662,002'Retractable post assembly with alarm function'20148,604,548'Semiconductor device having ESD device'20138,575,708'Structure of field effect transistor with fin structure'20138,574,990'Method of manufacturing semiconductor device having metal gate'20138,528,869'Retractable post with alarm device'20138,470,714'Method of forming fin structures in integrated circuits'20138,441,072'Non-planar semiconductor structure and fabrication method thereof'20138,404,535'Metal gate transistor and method for fabricating the same'20138,278,184'Fabrication method of a non-planar transistor'20128,252,657'Metal gate transistor and resistor and method for fabricating the same'20128,198,151'Method for fabricating a metal gate structure'2012D0661834'Lamp holder'20128,193,050'Method for fabricating semiconductor structure'20128,192,038'Photographic reflector'20128,190,303'Systems and methods to dissipate heat in an information handling system'20128,141,827'Tripod structure of stand'20128,084,824'Metal gate transistor and method for fabricating the same'20117,998,818'Method for making semiconductor element structure'20117,994,576'Metal gate transistor and resistor and method for fabricating the same'20117,932,146'Metal gate transistor and polysilicon resistor and method for fabricating the same'20117,888,195'Metal gate transistor and method for fabricating the same'20117,838,366'Method for fabricating a metal gate structure'20107,838,946'Method for fabricating semiconductor structure and structure of static random access memory'20107,816,243'Semiconductor device and method of fabricating the same'20107,804,141'Semiconductor element structure and method for making the same'20107,799,630'Method for manufacturing a CMOS device having dual metal gate'20107,759,202'Method for forming semiconductor device with gates of different materials'20107,682,932'Method for fabricating a hybrid orientation substrate'20107,659,189'Method for forming fully silicided gate electrode in a semiconductor device'20107,608,522'Method for fabricating a hybrid orientation substrate'20097,589,385'Semiconductor CMOS transistors and method of manufacturing the same'20097,348,685'Method and apparatus for supplying fresh water and generating electricity by collected rainwater'20087,186,657'Method for patterning HfO2-containing dielectric'20076,693,149'Process for preparing epoxy group-containing curable polyphenylene ether resin using high-molecular-weight polyphenylene resin'20046,569,982'Curable polyphenylene ether resin, composition made therefrom, and process for preparing the resin'20036,294,415'Method of fabricating a MOS transistor'20016,190,982'Method of fabricating a MOS transistor on a semiconductor wafer'20015,863,364'Ultrasonically welded electrical plug including illuminated indicator'19995,681,409'Ultrasonic welding of electrical plug'19975,655,829'Floodlight assembly'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2020Patents assigned to UNITED MICROELECTRONICS CORP (97)· patent assignee history
2001–2020Based in Hsinchu, TW· patent location history
2008–2020Based in Taipei, TW· patent location history
2011–2017Patents assigned to LIN CHIEN-TING (40)· patent assignee history
2011–2016Patents assigned to HSU CHE-HUA (9)· patent assignee history
2012–2015Patents assigned to TSAI SHIH-HUNG (11)· patent assignee history
2012–2016Patents assigned to CHEN YING-TSUNG (9)· patent assignee history
2012–2020Based in Santa Fe Springs, CA, US· patent location history
2013Based in Hsinchi, TW· patent location history
2016Based in SantaFeSprings, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNITED MICROELECTRONICS CORP972001–2020
LIN CHIEN-TINGself402011–2017
TSAI SHIH-HUNG112012–2015
CHEN YING-TSUNG92012–2016
HSU CHE-HUA92011–2016
Locations
LocationPatentsSpan
Hsinchu, TW982001–2020
Santa Fe Springs, California, US162012–2020
Taipei, TW72008–2020
SantaFeSprings, California, US12016
Hsinchi, TW12013