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Inventor

Rajesh Odedra

Inventor
Altrincham, GB

Overview

15→
Patents
2003–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material37%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H01LSemiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B01DSeparation3%
B05DProcesses for applying fluent materials to surfaces, in general3%
C12QMeasuring or testing processes involving enzymes, nucleic acids or microorganisms3%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis3%
C30BSingle-crystal growth3%
PatentTitleYear
10,240,230Process and method for in-situ dry cleaning of thin film deposition reactors and thin film layers20199,802,220'Molybdenum (IV) amide precursors and use thereof in atomic layer deposition'20179,175,023'Molybdenum allyl complexes and use thereof in thin film deposition'20159,028,917'High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films'20158,927,748'Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films'2015RE045124'Methods of atomic layer deposition using titanium-based precursors'20148,728,955'Method of plasma activated deposition of a conformal film on a substrate surface'20148,481,121'Methods of forming thin metal-containing films by chemical phase deposition'20138,476,467'Organometallic precursors for use in chemical phase deposition processes'20138,272,626'Bubbler for the transportation of substances by a carrier gas'20128,221,852'Methods of atomic layer deposition using titanium-based precursors'20128,039,062'Methods of atomic layer deposition using hafnium and zirconium-based precursors'20117,282,119'Process and apparatus for the isolation of pure, or substantially pure, organometallic compounds'20076,698,728'Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites'20046,573,053'Analysis method'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2014Based in Altrincham, GB· patent location history
2007–2014Based in Cheshire, GB· patent location history
2011–2015Patents assigned to SIGMA ALDRICH CO LLC (9)· patent assignee history
2012–2017Patents assigned to ODEDRA RAJESH (9)· patent assignee history
2012–2015Patents assigned to KANJOLIA RAVI (5)· patent assignee history
2012–2017Patents assigned to HEYS PETER NICHOLAS (3)· patent assignee history
2013–2015Patents assigned to BOAG NEIL (4)· patent assignee history
2015–2017Based in Victoria, CA· patent location history
2015Based in Altringham, GB· patent location history
2019Based in Sidney, CA· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ODEDRA RAJESHself92012–2017
SIGMA ALDRICH CO LLC92011–2015
KANJOLIA RAVI52012–2015
BOAG NEIL42013–2015
HEYS PETER NICHOLAS32012–2017
Locations
LocationPatentsSpan
Altrincham, GB72004–2014
Victoria, CA32015–2017
Cheshire, GB22007–2014
Sidney, CA12019
Altringham, GB12015