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Inventor

Shifu Xu

Inventor
Shanghai, CN

Overview

1→
Patents
2018
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Jprimary
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light33%
G01MTesting static or dynamic balance of machines or structures33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
PatentTitleYear
9,863,841'Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereof'2018

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to SHANGHAI INST OPTICS & FINE MECH CAS (1)· patent assignee history
2018Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHANGHAI INST OPTICS & FINE MECH CAS12018
Locations
LocationPatentsSpan
Shanghai, CN12018