Inventor
HIROFUMI MORITA
Inventor
JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy7%
H02JElectric power networks7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C25BElectrolytic or electrophoretic processes for the production of compounds or non-metals4%
G05BControl or regulating systems in general4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
12,592,360Multi charged particle beam writing method and multi charged particle beam writing apparatus202612,580,148Multi charged particle beam writing apparatus202612,406,828Optical system adjustment method for multi charged particle beam apparatus and computer readable recording medium202512,009,175Charged particle beam writing apparatus202411,908,659Multi charged particle beam writing apparatus202411,804,360Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatus202311,784,335Hydrogen-energy control system and control method for hydrogen-energy control system202311,756,766Charged particle beam writing apparatus and charged particle beam writing method202311,721,520Semiconductor device, multi-charged-particle beam writing apparatus, and multi-charged-particle beam exposure apparatus202311,710,839Controller, controlling method, and record medium202311,355,302Multi-beam blanking device and multi-charged-particle-beam writing apparatus202211,312,815Polyurethane resin, producing method of polyurethane resin, and molded article202211,217,428Multi charged particle beam writing apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to NUFLARE TECHNOLOGY INC (10)· patent assignee history
2022Patents assigned to MITSUI CHEMICALS INC (1)· patent assignee history
2022–2026Based in JP· patent location history
2023Patents assigned to TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NUFLARE TECHNOLOGY INC | 10 | 2022–2026 |
| TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORP | 2 | 2023 |
| MITSUI CHEMICALS INC | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 13 | 2022–2026 |