Inventor
Manabu Isobe
Inventor
Hiratsuka, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G06TImage data processing or generation, in general25%
G06FElectric digital data processing17%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G06KGraphical data reading8%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
10,586,323Reference-image confirmation method, mask inspection method, and mask inspection device202010,572,990Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system20209,165,355'Inspection method'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to NUFLARE TECHNOLOGY INC (3)· patent assignee history
2015Based in Kanagawa, JP· patent location history
2020Based in Hiratsuka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NUFLARE TECHNOLOGY INC | 3 | 2015–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hiratsuka, JP | 2 | 2020 |
| Kanagawa, JP | 1 | 2015 |