Inventor

Hisayuki Saito

Inventor

Shirakawa, JP

Overview

2010–2021

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%

G01NInvestigating or analysing materials by determining their chemical or physical properties16%

C30BSingle-crystal growth11%

G01BMeasuring length, thickness or similar linear dimensions11%

H01LSemiconductor devices11%

G01DMeasuring not specially adapted for a specific variable5%

G01RMeasuring electric variables5%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%

H10DInorganic electric semiconductor devices5%

Y10TTechnical subjects covered by former us classification5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2010–2021Patents assigned to SHINETSU HANDOTAI KK (6)· patent assignee history

2010Based in Fukushima, JP· patent location history

2012–2016Patents assigned to SAITO HISAYUKI (2)· patent assignee history

2012–2016Based in Nishishirakawa, JP· patent location history

2016Patents assigned to FUSEGAWA IZUMI (1)· patent assignee history

2016Patents assigned to HOSHI RYOJI (1)· patent assignee history

2016Patents assigned to SONOKAWA SUSUMU (1)· patent assignee history

2019–2021Based in Shirakawa, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations