Inventor
Masami Nakamura
Inventor
Yokohama, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Fprimary
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
H01BCables7%
C23CCoating metallic material5%
G10LSpeech analysis techniques or speech synthesis5%
H01LSemiconductor devices5%
C03CChemical composition of glasses, glazes or vitreous enamels3%
C30BSingle-crystal growth3%
G11BInformation storage based on relative movement between record carrier and transducer3%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems3%
PatentTitleYear
10,796,710Noise elimination device, noise elimination method, and noise elimination program202010,347,787Method for forming a solar cell electrode with conductive paste201910,142,756Signal processing device and signal processing method201810,084,100Solar cell element and method for manufacturing same20189,214,162'Audio-signal correction apparatus, audio-signal correction method and audio-signal correction program'20158,989,405'Audio signal correction apparatus, audio signal correction method, and audio signal correction program'20158,962,981'Solar cell device and manufacturing method therefor'20158,854,238'Asynchronous sampling frequency conversion device, method, and computer program product'20148,551,368'Conductive paste for forming a solar cell electrode'20138,368,569'Data converting device, program and method'20137,542,318'Capacitor mounting type inverter unit having a recessed cover'20097,094,289'Method for manufacturing highly-crystallized oxide powder'20066,906,935'Inverter apparatus and method of manufacturing the same'20055,935,324'Apparatus and method for forming I-III-VI.sub.2 thin-film layers'19995,538,731'Cosmetic'19965,251,648'Method for plumping and moisture regulating cut tobacco'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2009Based in Wako, JP· patent location history
2006–2019Patents assigned to SHOEI CHEMICAL IND CO (5)· patent assignee history
2013–2019Patents assigned to NAKAMURA MASAMI (7)· patent assignee history
2013–2019Patents assigned to KANASAKU TADASHI (4)· patent assignee history
2013–2019Patents assigned to SHINDO NAOTO (4)· patent assignee history
2013–2019Based in Kunitachi, JP· patent location history
2013–2014Based in Tokyo, JP· patent location history
2014–2018Patents assigned to JVC KENWOOD CORP (4)· patent assignee history
2015–2020Based in Yokohama, JP· patent location history
2018Based in Ome, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NAKAMURA MASAMIself | 7 | 2013–2019 |
| SHOEI CHEMICAL IND CO | 5 | 2006–2019 |
| JVC KENWOOD CORP | 4 | 2014–2018 |
| KANASAKU TADASHI | 4 | 2013–2019 |
| SHINDO NAOTO | 4 | 2013–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 3 | 2015–2020 |
| Kunitachi, JP | 3 | 2013–2019 |
| Tokyo, JP | 2 | 2013–2014 |
| Wako, JP | 2 | 2005–2009 |
| Ome, JP | 1 | 2018 |