Inventor

Katsutoshi Ihara

Inventor
Yonezawa, JP

Overview

1→
Patents
2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B26Fprimary
B26FPerforating20%
C10MLubricating compositions20%
C10NIndexing scheme associated with subclass c10m relating to lubricating compositions20%
H05KPrinted circuits20%
Y10TTechnical subjects covered by former us classification20%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to MITSUBISHI GAS CHEMICAL CO (1)· patent assignee history
2017Based in Yonezawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO12017
Locations
LocationPatentsSpan
Yonezawa, JP12017