Inventor

Po-Chung Cheng

Inventor

Chiayi County, TW

Overview

2014–2021

Patent span

Physics

Primary field (CPC G)

Patents· 65 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%

H05GX-ray technique21%

H01LSemiconductor devices9%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

B08BCleaning in general2%

G02BOptical elements, systems or apparatus2%

G21KHandling of particles or ionising radiation not otherwise provided for2%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%

G01BMeasuring length, thickness or similar linear dimensions2%

G01MTesting static or dynamic balance of machines or structures2%

PatentTitleYear

11,134,558Droplet generator assembly and method for using the same and radiation source apparatus2021 11,121,018Method and apparatus for lithography in semiconductor fabrication2021 11,106,146Lithography system and method2021 11,092,555EUV vessel inspection method and related system2021 11,086,225Lithography system and method thereof2021 11,086,237Extreme ultraviolet lithography system2021 11,086,209EUV lithography mask with a porous reflective multilayer structure2021 11,071,191Extreme ultraviolet radiation source and cleaning method thereof2021 11,067,906Droplet catcher system of EUV lithography apparatus and EUV lithography apparatus maintenance method2021 11,062,898Particle removal apparatus, particle removal system and particle removal method2021 10,877,378Vessel for extreme ultraviolet radiation source2020 10,880,981Collector pellicle2020 10,880,980EUV light source and apparatus for EUV lithography2020 10,875,060Method and apparatus for removing debris from collector2020 10,877,190Extreme ultraviolet radiation source2020 10,871,719EUV metal droplet catchers2020 10,871,713Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning2020 10,867,933Method for forming semiconductor device structure with overlay grating2020 10,859,918Semiconductor apparatus and method of operating the same2020 10,859,928EUV light source and apparatus for lithography2020 10,852,191Light source system and polarization angle adjusting method2020 10,852,649Methods and apparatus for removing contamination from lithographic tool2020 10,842,009System and method for extreme ultraviolet source control2020 10,824,083Light source, EUV lithography system, and method for generating EUV radiation2020 10,802,394Method for discharging static charges on reticle2020 10,802,405Radiation source for lithography exposure process2020 10,802,406Apparatus and method for generating extreme ultraviolet radiation2020 10,791,616Radiation source apparatus2020 10,779,387Extreme ultraviolet photolithography system and method2020 10,747,119Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source2020 10,734,325Method for forming semiconductor device structure with overlay grating2020 10,725,384Communication control method2020 10,720,419Layout modification method for exposure manufacturing process2020 10,718,718EUV vessel inspection method and related system2020 10,712,651Method and apparatus for collecting information used in image-error compensation2020 10,712,676Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system2020 10,714,371Method and apparatus for lithography in semiconductor fabrication2020 10,684,561Lithography method2020 10,687,410Extreme ultraviolet radiation source and cleaning method thereof2020 10,678,148Lithography system and lithography method2020 10,678,138Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation2020 10,670,970Lithography system and method thereof2020 10,663,871Reticle stage and method for using the same2020 10,663,633Aperture design and methods thereof2020 10,656,539Radiation source for lithography process2020 10,642,158Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning2020 10,631,392EUV collector contamination prevention2020 10,624,196Laser source device and extreme ultraviolet lithography device2020 10,534,279Methods and apparatus for removing contamination from lithographic tool2020 10,524,345Residual gain monitoring and reduction for EUV drive laser2019 10,509,334Methods and apparatus for removing contamination from lithographic tool2019 10,512,147Extreme ultraviolet radiation source and droplet catcher thereof2019 10,506,698EUV source generation method and related system2019 10,495,987Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system2019 10,477,663Light source for lithography exposure process2019 10,461,037Method for forming semiconductor device structure with overlay grating2019 10,429,314EUV vessel inspection method and related system2019 10,429,729EUV radiation modification methods and systems2019 10,366,973Layout modification method for exposure manufacturing process2019 10,342,109Apparatus and method for generating extreme ultraviolet radiation2019 10,314,154System and method for extreme ultraviolet source control2019 10,274,844Lithography apparatus and method for protecting a reticle2019 10,204,867Semiconductor metrology target and manufacturing method thereof2019 10,162,277Extreme ultraviolet lithography system with debris trapper on exhaust line2018 8,778,602'Single photoresist approach for high challenge photo process'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014Patents assigned to CHEN JING-HUAN (1)· patent assignee history

2014Patents assigned to CHENG PO-CHUNG (1)· patent assignee history

2014Patents assigned to CHIANG HSIN-CHUN (1)· patent assignee history

2014Patents assigned to MA WEI-CHUNG (1)· patent assignee history

2014–2021Based in Zhongpu Township, TW· patent location history

2018–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (64)· patent assignee history

2018–2021Based in Chiayi County, TW· patent location history

2019Based in Chiayi, TW· patent location history

2020Based in Longxing Village, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	64	2018–2021
CHEN JING-HUAN	1	2014
CHENG PO-CHUNGself	1	2014
CHIANG HSIN-CHUN	1	2014
MA WEI-CHUNG	1	2014

Locations

Location	Patents	Span
Chiayi County, TW	51	2018–2021
Zhongpu Township, TW	9	2014–2021
Longxing Village, TW	2	2020
Chiayi, TW	1	2019