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Inventor

Mitsuko Odagaki

Inventor
Kanagawa, JP

Overview

4→
Patents
2003–2008
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C25Dprimary
C25DProcesses for the electrolytic or electrophoretic production of coatings33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H05KPrinted circuits17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
PatentTitleYear
7,387,717'Method of performing electrolytic treatment on a conductive layer of a substrate'20087,208,074'Substrate processing apparatus and substrate plating apparatus'20076,689,257'Substrate processing apparatus and substrate plating apparatus'20046,632,335'Plating apparatus'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2008Patents assigned to EBARA CORP (4)· patent assignee history
2003–2008Patents assigned to TOSHIBA KK (2)· patent assignee history
2003–2008Based in Kanagawa, JP· patent location history
2004–2007Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP42003–2008
TOSHIBA KK22003–2008
Locations
LocationPatentsSpan
Kanagawa, JP22003–2008
Yokohama, JP22004–2007