Inventor

Peter Danny Van Voorst

Inventor
Nijmegen, NL

Overview

6→
Patents
2017–2020
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
G01NInvestigating or analysing materials by determining their chemical or physical properties26%
G02BOptical elements, systems or apparatus16%
G01BMeasuring length, thickness or similar linear dimensions11%
H05GX-ray technique11%
G21KHandling of particles or ionising radiation not otherwise provided for5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2020Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2017–2020Based in Nijmegen, NL· patent location history
2019Based in Nijmegan, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV62017–2020
Locations
LocationPatentsSpan
Nijmegen, NL52017–2020
Nijmegan, NL12019